Diamond-like film and process for producing same
First Claim
1. A process for depositing an amorphous, carbonaceous film having a stress below 1010 dynes/cm2 and a hydrogen content of one or less atomic percent on a substrate in an evacuated deposition chamber having an internal pair of substantially horizontal and parallel, vertically spaced carbon electrodes, and means for applying radio frequency power to said pair of electrodes;
- comprising the steps of;
(a) positioning said substrate on the lower electrode of said pair of electrodes;
(b) stabilizing the pressure within said deposition chamber with a lower alkane containing from 1 up to about 6 carbon atoms at a pressure of from about 25 up to about 100 millitorr;
(c) applying radio frequency power to said pair of electrodes; and
(d) biasing the upper electrode of said pair in the range of from about -200 to about -3500 volts and said lower electrode in the range of from about 0 to about -100 volts, whereby said film deposits on said substrate by radio frequency plasma decomposition of said lower alkane.
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Abstract
An amorphous, carbonaceous, diamond-like film and a process for producing the same is disclosed. The film has an extremely low hydrogen content and an extremely low stress, is resistant to both acids and alkalis, and adheres tenaciously to many types of substrates including glasses, plastics, metals, and semiconductors. The process for producing this film is a hybrid process using radio frequency plasma decomposition of an alkane and a pair of spaced carbon electrodes.
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Citations
7 Claims
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1. A process for depositing an amorphous, carbonaceous film having a stress below 1010 dynes/cm2 and a hydrogen content of one or less atomic percent on a substrate in an evacuated deposition chamber having an internal pair of substantially horizontal and parallel, vertically spaced carbon electrodes, and means for applying radio frequency power to said pair of electrodes;
- comprising the steps of;
(a) positioning said substrate on the lower electrode of said pair of electrodes; (b) stabilizing the pressure within said deposition chamber with a lower alkane containing from 1 up to about 6 carbon atoms at a pressure of from about 25 up to about 100 millitorr; (c) applying radio frequency power to said pair of electrodes; and (d) biasing the upper electrode of said pair in the range of from about -200 to about -3500 volts and said lower electrode in the range of from about 0 to about -100 volts, whereby said film deposits on said substrate by radio frequency plasma decomposition of said lower alkane. - View Dependent Claims (2, 3, 4, 5, 6, 7)
- comprising the steps of;
Specification