Apparatus for the photolithographic manufacture of integrated circuit elements

• US 4,509,852 A
• Filed: 08/17/1982
• Issued: 04/09/1985
• Est. Priority Date: 10/06/1980
• Status: Expired due to Fees

• Current Assignee: Mercotrust AG
• Original Assignee: Perkin-Elmer Censor Anstalt
• Inventors: Tabarelli, Werner, Lobach, Ernst W.
• Primary Examiner(s): WINTERCORN, RICHARD
• Application Number:
  US06/408,727
• Time in Patent Office: 966 Days
• Field of Search: 355/75, 355/76, 355/27, 355/30, 352/5, 354/195
• US Class Current: 355/30
• CPC Class Codes: G03F 7/70241 Optical aspects of refractive lens systems, i.e. comprising only refractive elements
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70875 Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
• CPC Class Codes: G03F 7/70891 Temperature

Abstract

Using a photolithographic projection apparatus a mask having a pattern is imaged on a photosensitive layer coating a semiconductor substrate by a projection lens. To improve the resolving capability and to obviate adverse effects, e.g. standing waves and inhomogeneous exposure, the space between the substrate and the adjacent boundary face of a projection lens is filled during exposure with a transparent liquid having the same refractive index as the photosensitive layer.

Claims

1. An apparatus for the photolithographic printing of a pattern onto a semiconductor substrate, comprising:

a substantially horizontal support for said semiconductor substrate;

means for horizontally moving said support in mutually orthogonal X and Y directions for step-by-step exposure of successive portions of said semiconductor substrate;

a projection lens disposed above said support and said semiconductor substrate for imaging a pattern of a mask upon each of the successive portions of said semiconductor substrate to activate a photosensitive layer thereon, as said portions are aligned with said lens by the movement of said support in said X and Y directions;

a basin carried by and movable with said support, receiving said semiconductor substrate and having an upper rim lying above at least a lower face of said lens whereby said lower face projects into said basin; and

flexible pipe mens for feeding a transparent liquid having a refractive index close to that of said layer into said basin, for removing said liquid from said basin and for maintaining the level of liquid in said basin always above said lower face for imaging of said pattern upon said successive portions under constant conditions of filling of the space between said layer and said face with said liquid, said liquid being capable of wetting said layer and substantially incapable of attacking same.

2. The apparatus defined in claim 1 wherein said flexible pipe means includes a flexible feed pipe and a flexible discharge pipe for said transparent liquid, said pipes opening into said basin below the level of said face.

3. The apparatus defined in claim 2 wherein said feed pipe and said discharge pipe are connected in a closed circulating path for said liquid, said path including a filter for cleaning the circulated liquid.

4. The apparatus defined in claim 3 wherein said path further includes means for maintaining said liquid at a constant temperature.