Method for production of a moisture sensor

• US 4,515,653 A
• Filed: 04/27/1984
• Issued: 05/07/1985
• Est. Priority Date: 04/30/1983
• Status: Expired due to Term

• Current Assignee: Sharp Kabushiki Kaisha (Hon Hai Precision Industry Co., Ltd.)
• Original Assignee: Sharp Kabushiki Kaisha (Hon Hai Precision Industry Co., Ltd.)
• Inventors: Tanaka, Junichi, Watanabe, Masanori, Hijikigawa, Masaya, Furubayashi, Hisatoshi
• Primary Examiner(s): Powell, William A.
• Application Number:
  US06/604,386
• Time in Patent Office: 375 Days
• Field of Search: 73/73-77, 156/643, 156/646, 156/655, 156/659.1, 156/668, 156/901, 156/902, 236/44 R, 236/44 C, 236/44 E, 236/DIG. 13, 204/192 E, 204/164, 252/79.1
• US Class Current: 216/67
• CPC Class Codes: G01N 27/121 for determining moisture content, e.g. humidity, of the fluid moisture content of the tested material G01N27/048
• CPC Class Codes: G01N 27/126 comprising organic polymers

Abstract

A method for production of a moisture sensor comprising forming a moisture sensitive polymer film on a substrate, disposing a patterned masking material on said moisture sensitive polymer film, and etching said moisture sensitive film by means of an oxygen plasma, whereby a desired fine pattern of the moisture sensitive film is formed with fair accuracy and reproducibility.

Claims

1. A method for production of a moisture sensor comprising forming a moisture sensitive polymer film on a substrate, disposing a patterned masking material on said moisture sensitive polymer film, and etching said moisture sensitive film by means of an oxygen plasma.

2. A method for preparation of a moisture sensor according to claim 1, wherein said moisture sensitive polymer film is subjected to a heat treatment prior to said etching step.

3. A method for production of a moisture sensor according to claim 2, wherein said moisture sensitive polymer film is heat-treated at a temperature ranging from 150°

C. to 250°

C.

4. A method for production of a moisture sensor according to claim 1, wherein said moisture sensitive polymer film is made of at least one selected from the group consisting of cellulose, polyamide, polyacrylate, polystyrenesulfonate, and polyvinyl alcohol.

5. A method for production of a moisture sensor according to claim 2, wherein said moisture sensitive polymer film is made of at least one selected from the group consisting of cellulose, polyamide, polyacrylate, polystyrenesulfonate, and polyvinyl alcohol.

6. A method for production of a moisture sensor according to claim 3, wherein said moisture sensitive polymer film is made of at least one selected from the group consisting of cellulose, polyamide, polyacrylate, polystyrenesulfonate, and polyvinyl alcohol.