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Non-mass-analyzed ion implantation

  • US 4,533,831 A
  • Filed: 03/21/1983
  • Issued: 08/06/1985
  • Est. Priority Date: 03/24/1982
  • Status: Expired due to Term
First Claim
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1. A non-mass-analyzed ion implantation process using ions generated from a compound without selecting a single ion species, comprising the steps of:

  • generating ions, which include at least two species of ions of the same polarity, from a compound source material;

    accelerating said ions;

    scanning said accelerated ions electromagnetically and repetitively in a direction transverse to an acceleration direction; and

    implanting beams of said scanned ions, including said at least two species of ions, into a target, with said at least two species of ions being implanted with different distribution profiles of implanted ion doses.

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