Plasma monitoring method and plasma monitor

• US 4,541,718 A
• Filed: 01/05/1983
• Issued: 09/17/1985
• Est. Priority Date: 01/12/1982
• Status: Expired due to Term

• Current Assignee: Hitachi, Ltd.
• Original Assignee: Hitachi, Ltd.
• Inventors: Watanabe, Masahiro, Hiratsuka, Yutaka, Osada, Hisajiro
• Primary Examiner(s): Evans, F. L.
• Assistant Examiner(s): TURNER, SAMUEL A
• Application Number:
  US06/455,802
• Time in Patent Office: 986 Days
• Field of Search: 356/316, 356/417, 356/418, 356/306, 356/310
• US Class Current: 356/316
• CPC Class Codes: G01N 21/62 Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
• CPC Class Codes: H05H 1/0037 by spectrometry

Abstract

A plasma monitoring method and a plasma monitor in a dry process which utilizes a plasma. Among a large number of chemical species which constitute the plasma, one or two specified chemical species suited to grasp the situation of the dry process has/have its/their plasma light/lights detected so as to obtain the three-dimensional distribution of the densities of the single specified chemical species or the ratios of the two specified chemical species in the plasma.

Claims

1. A plasma monitoring method comprising the step of condensing plasma light at a measurement position of a plasma, the measurement position being successively selected;

the step of detecting the condensed plasma light at said each measurement position by spectroscopically dividing it into plasma light which is emitted by all chemical species constituting said plasma, and plasma light which is emitted by a specified chemical species contained in said plasma, the condensed plasma light being divided into plasma light emitted by all chemical species and by a specified chemical species using a single light filter with a plurality of filter portions; and

the step of finding a density of the specified chemical species at said each measurement position on the basis of the divided plasma light detected by spectroscopically dividing the plasma light using the single light filter;

thereby to measure a distributed state of the densities of said specified chemical species contained in said plasma.

2. A plasma monitoring method according to claim 1, wherein the condensed plasma light is spectroscopically divided using a mask and said filter, the mask and filter being so phased as to attenuate the quantity of plasma light for said specified chemical species and for all chemical species at predetermined proportions.

3. A plasma monitoring method comprising the step of condensing plasma light at a measurement position of a plasma, the measurement position being successively selected;

the step of detecting the condensed plasma light at said each measurement position by spectroscopically dividing it into two sorts of plasma lights which are emitted by two specified chemical species among all chemical species constituting said plasma, the condensed plasma light being divided into one sort of plasma light emitted by one specified chemical species, and a second sort of plasma light emitted by a second specified chemical species, using a single light filter with a plurality of filter portions; and

the step of finding a ratio between said two specified chemical species at said each measurement position on the basis of the two sorts of plasma lights detected by spectroscopically dividing the plasma light using the single light filter;

thereby to measure a distribution of the properties of said two specified chemical species in said plasma.

4. A plasma monitoring method according to claim 3, wherein the condensed plasma light is spectroscopically divided using a mask and said filter, the mask and filter being so phased as to attenuate the quantity of plasma light for the two sorts of plasma lights at predetermined proportions.

5. A plasma monitor comprising:

light condensing means including a condensing optical system which opposes to a window of a processor and which condenses plasma light at a measurement position in the processor through the window, said means selecting such measurement positions by moving said condensing optical system in three-dimensional directions relative to said window;

spectroscopic means for spectroscopically dividing the plasma light condensed by said light condensing means, into two sorts of plasma lights to-be-detected, said spectroscopic means including a rotatable single light filter having a plurality of filter portions, with the plurality of filter portions acting to divide the plasma light into the two sorts of plasma lights to-be-detected;

photodetection means alternately receiving the two sorts of plasma lights spectroscopically divided by said spectroscopic means, and for converting the received plasma lights into electric signals corresponding to intensities thereof, for amplifying the electric signals and for discriminating which of said two sorts of plasma lights said electric signals correspond to;

control means for instructing said light condensing means the measurement position of said plasma and for transmitting coordinate signals of said measurement position of said plasma;

measurement means connected to said photodetection means and said control means, and for measuring a specified chemical species on the basis of the two electric signals applied thereto from said photodetection means and for bringing into correspondence the measured result and said coordinate signals applied thereto from said control means; and

displaying means and/or recording means constructed to said measurement means, and for displaying and/or recording said coordinates of said measurement position and said measured result which are applied thereto from said measurement means.

6. A plasma monitor according to claim 5, wherein said condensing optical system includes a collimator and lens means in said collimator, the collimator having a pinhole therein, the lens means being positioned such that light passing from the focal point of said lens means will pass through said pinhole while light passing from other locations will not pass through the pinhole, whereby three-dimensional measurement of the plasma can be achieved.

7. A plasma monitor according to claim 5, wherein said condensing optical system comprises optical fiber, a collimator which is disposed at an end part of said optical fiber on a light condensing side, and a lens which is disposed at an end part of said collimator on the light condensing side.

8. A plasma monitor according to claim 5, wherein said spectroscopic means includes a mask, which opens and closes an optical path of the plasma light emitted from said light condensing means, and said filter which spectroscopically divides the plasma light having passed through said mask into the two sorts of plasma lights to-be-detected, said mask and filter being supported on a rotary shaft of rotation driving means.

9. A plasma monitor according to claim 8, wherein the mask and filter are so phased as to attenuate the quantity of plasma light at predetermined proportions.

10. A plasma monitor according to claim 8, wherein said filter comprises a pair of filter portions each of which has a wavelength selectivity of allowing only plasma light of specified wavelength to pass therethrough.

11. A plasma monitor according to claim 8, wherein said filter comprises a filter portion which has a wavelength selectivity of allowing only plasma light of specified wavelength to pass therethrough, and a filter portion which has a slight wavelength selectivity and exhibits a light attenuating property.