Negative-type acetalized polyvinyl alcohol resist sensitive to ionizing radiation

• US 4,556,619 A
• Filed: 10/05/1982
• Issued: 12/03/1985
• Est. Priority Date: 09/03/1982
• Status: Expired due to Fees

• Current Assignee: Dai Nippon Printing Company Limited
• Original Assignee: Dai Nippon Printing Company Limited
• Inventors: Oguchi, Kiyoshi, Sanui, Kohei, Tanaka, Hozumi, Takahashi, Yoichi, Ogata, Naoya, Nakada, Tomihiro, Azuma, Chiaki
• Primary Examiner(s): Schilling, Richard L.
• Application Number:
  US06/432,865
• Time in Patent Office: 1,155 Days
• Field of Search: 430/270, 430/296, 430/286, 430/907, 430/909, 430/17, 204/159.14, 204/159.21, 204/159.22, 525/61, 526/208
• US Class Current: 430/17
• CPC Class Codes: G03F 7/038 Macromolecular compounds which are rendered insoluble or differentially wettable G03F7/075 takes precedence; macromolecular azides G03F7/012; macromolecular diazonium compounds G03F7/021
• CPC Class Codes: Y10S 430/108 Polyolefin or halogen containing
• CPC Class Codes: Y10S 430/11 Vinyl alcohol polymer or derivative

Abstract

An acetalized polyvinyl alcohol having a molecular weight of 10,000 to 1,000,000 represented by the formula: ##STR1## wherein: R¹ represents a halogen-containing residue of an aldehyde or a ketone; R² represents a hydrogen atom, which may partially be substituted with an acetyl group; R³ represents naught or a monomeric unit copolymerizable with vinyl acetate; and l, m, n are integers indicating polymerization degrees, has excellent characteristics such as high sensitivity, high resolving power and excellent dry etching resistance and is suitable as a negative-type resist in ionizing radiation lithography.

Claims

1. A negative-type resist cross-linked by exposure to ionizing radiation, which comprises a cross-linked acetalized polyvinyl alcohol polymer having a molecular weight of 10,000 to 1,000,000 represented by the formula:

##STR29## wherein;

R¹ represents an aromatic ring having halogen substitution;

R² represents a hydrogen atom, which may partially be substituted by an acetyl group;

R³ being absent or if present, being a monomeric unit copolymerizable with vinyl acetate; and

l, m, n are integers indicating polymerization degrees.

2. A negative-type resist according to claim 1, which comprises a mixture of said polyvinyl alcohol polymer with another polymer compatible therewith.

3. A negative-type resist according to claim 2, wherein said another polymer is selected from polyvinyl acetate, ethylene/vinyl acetate copolymer, styrene/vinyl acetate copolymer and partially saponified products thereof.

4. A negative type resist according to claim 1, wherein the acetalized moiety content as represented by 1/(l+m+n) in said acetalized polyvinyl alcohol is 20 to 85 mole %.