Method for diffusion of impurities

• US 4,565,588 A
• Filed: 10/10/1984
• Issued: 01/21/1986
• Est. Priority Date: 01/20/1984
• Status: Expired due to Term

• Current Assignee: Fuji Electric Corporate Research & Development, Ltd. (Fuji Electric Systems Company Limited)
• Original Assignee: Fuji Electric Corporate Research & Development, Ltd. (Fuji Electric Systems Company Limited)
• Inventors: Sato, Noritada, Seki, Yasukazu
• Primary Examiner(s): NOT, DEFINED
• Application Number:
  US06/659,360
• Time in Patent Office: 468 Days
• Field of Search: 148/188, 148/186
• US Class Current: 438/535
• CPC Class Codes: H01L 21/2255 the applied layer comprising oxides only, e.g. P2O5, PSG, H3BO3, doped oxides

Abstract

In the particular embodiments of the invention described in the specification, impurities are diffused into a silicon substrate by applying a solution of the impurity to the substrate, drying the substrate and subjecting it to a glow discharge in an inert gas atmosphere at a pressure of 0.2 to 0.7 Torr and a substrate temperature of 300° C. A semiconductor with n-type properties is formed by using phosphoric acid to provide phosphorus as the impurity and a p-type semiconductor is formed by using boric acid to provide boron as the impurity. Impurity depths of less than one μm are obtained using a solution containing 0.01 parts per 1000 by volume of the impurity.

Claims

1. A method for diffusion of a desired impurity into a semiconductor substrate, wherein said impurity is capable of acting as a donor or acceptor in a semiconductor, which comprises introducing the impurity into a liquid of high volatility in which the impurity is highly soluble, applying the resultant solution to the semiconductor substrate, drying the semiconductor substrate, and exposing the dried semiconductor substrate to an inactive gas plasma at a temperature less than 300°

C., thereby diffusing the impurity into said semiconductor substrate.

2. A method according to claim 1, wherein the impurity acts as an electron donor whereby an n-type semiconductor layer is created by diffusion of the impurity.

3. A method according to claim 2, wherein the impurity is phosphorus.

4. A method according to claim 3, wherein the phosphorus is introduced into the liquid of high volatility in the form of phosphoric acid.

5. A method according to claim 4, wherein the liquid of high volatility is selected from the group consisting of methyl alcohol, ethyl alcohol and water, and phosphoric acid is introduced to said liquid in a volume ratio of from 0.01/1000 to 10/1000.

6. A method according to claim 1, wherein the impurity acts as an electron acceptor whereby a p-type semiconductor layer is created by diffusion of the impurity.

7. A method according to claim 6, wherein the impurity is boron.

8. A method according to claim 7, wherein the boron is introduced into the liquid of high volatility in the form of boric acid.

9. A method according to claim 8, wherein the liquid of high volatility is selected from the group consisting of methyl alcohol and water, and boric acid is introduced to said liquid in volume ratio of from 0.001/1000 to 10/1000.

10. The method of claim 1, wherein the semiconductor substrate is silicon.

11. A method according to claim 10, wherein the impurity acts as an electron donor whereby an n-type semiconductor layer is created by diffusion of the impurity.

12. A method according to claim 11, wherein the impurity is phosphorus.

13. A method according to claim 12, wherein the phosphorus is introduced into the liquid of high volatility in the form of phosphoric acid.

14. A method according to claim 13, wherein the liquid of high volatility is selected from the group consisting of methyl alcohol, ethyl alcohol and water, and phosphoric acid is introduced to said liquid in a volume ratio of from 0.01/1000 to 10/1000.

15. A method according to claim 10, wherein the impurity acts as an electron acceptor whereby a p-type semiconductor layer is created by diffusion of the impurity.

16. A method according to claim 15, wherein the impurity is boron.

17. A method according to claim 16, wherein the boron is introduced into the liquid of high volatility in the form of boric acid.

18. A method according to claim 17, wherein the liquid of high volatility is selected from the group consisting of methyl alcohol and water, and boric acid is introduced to said liquid in volume ratio of from 0.001/1000 to 10/1000.