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Method of producing amorphous carbon coatings on substrates by plasma deposition

  • US 4,569,738 A
  • Filed: 05/04/1984
  • Issued: 02/11/1986
  • Est. Priority Date: 05/06/1983
  • Status: Expired due to Fees
First Claim
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1. A method of producing an amorphous carbon coating on a substrate within a reaction chamber comprising:

  • introducing an ionizable, gaseous hydrocarbon compound within the reaction chamber;

    transporting a substrate in the reaction chamber in a sustained atmosphere including said ionizable, gaseous hydrocarbon compound; and

    applying, by at least one ladder-like wave guide disposed transversely of the direction of transport of the substrate and which is aligned at an acute angle with the substrate surface and is connected at one end to a microwave transmitter, an electromagnetic alternating field having a frequency in the microwave region and having a sufficiently high power to ionize the gaseous hydrocarbon compound and to bring the energy of the carbon-containing ions impinging on the substrate above a threshold value sufficient to produce an amorphous carbon coating on the substrate.

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