×

Titanium disulfide thin film and process for fabricating the same

  • US 4,572,873 A
  • Filed: 02/19/1985
  • Issued: 02/25/1986
  • Est. Priority Date: 09/13/1982
  • Status: Expired due to Term
First Claim
Patent Images

1. A titanium disulfide film fabricated by chemical vapor deposition on a substrate, which comprises crystallites of titanium disulfide each being oriented at an angle of its c-axis to the substrate surface of not more than 45°

  • on average.

View all claims
  • 0 Assignments
Timeline View
Assignment View
    ×
    ×