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Induction heated reactor system for chemical vapor deposition

  • US 4,579,080 A
  • Filed: 02/06/1985
  • Issued: 04/01/1986
  • Est. Priority Date: 12/09/1983
  • Status: Expired due to Term
First Claim
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1. In a chemical vapor deposition system, in combination:

  • a generally closed reaction chamber having walls formed from a dielectric material;

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