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Resolution device for semiconductor thin films

  • US 4,584,886 A
  • Filed: 09/25/1984
  • Issued: 04/29/1986
  • Est. Priority Date: 09/26/1983
  • Status: Expired due to Term
First Claim
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1. A semiconductor film resolution device for manufacturing samples to be used for analyzing ultratrace amounts of impurities in semiconductor films by resolving the films with a resolution reagent gas in a sealed container, comprising:

  • (a) storage means in said sealed container for storing hydrofluoric acid and for generating hydrogen fluoride gas;

    (b) hydrofluoric acid stored in said storage means so as to generate said hydrogen fluoride gas;

    (c) means for holding at least one semiconductor film sample within said sealed container so as to contact said sample with said hydrogen fluoride gas; and

    (d) resolved solution tray means provided in said sealed container for receiving resolved solution from said sample so as to separate said resolved solution from both said sample and said hydrofluoric acid.

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