Resolution device for semiconductor thin films
First Claim
1. A semiconductor film resolution device for manufacturing samples to be used for analyzing ultratrace amounts of impurities in semiconductor films by resolving the films with a resolution reagent gas in a sealed container, comprising:
- (a) storage means in said sealed container for storing hydrofluoric acid and for generating hydrogen fluoride gas;
(b) hydrofluoric acid stored in said storage means so as to generate said hydrogen fluoride gas;
(c) means for holding at least one semiconductor film sample within said sealed container so as to contact said sample with said hydrogen fluoride gas; and
(d) resolved solution tray means provided in said sealed container for receiving resolved solution from said sample so as to separate said resolved solution from both said sample and said hydrofluoric acid.
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Accused Products
Abstract
The resolution device for semiconductor films according to the present invention comprises a sealed container, a storage container installed in the sealed container for storing hydrofluoric acid to generate hydrogen fluoride gas, a semiconductor film supporter installed in the sealed container, and a receptacle of resolved solution installed at the bottom of the sealed container for receiving the resolved solution of the semiconductor films. The semiconductor films held by the film supporter are resolved by hydrogen fluoride gas which is generated from the storage container of hydrofluoric acid and has a low impurity content. The resolved solution is collected in the receptacle for resolved solution, and is supplied directly to the flameless atomic absorption spectrophotometer.
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Citations
7 Claims
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1. A semiconductor film resolution device for manufacturing samples to be used for analyzing ultratrace amounts of impurities in semiconductor films by resolving the films with a resolution reagent gas in a sealed container, comprising:
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(a) storage means in said sealed container for storing hydrofluoric acid and for generating hydrogen fluoride gas; (b) hydrofluoric acid stored in said storage means so as to generate said hydrogen fluoride gas; (c) means for holding at least one semiconductor film sample within said sealed container so as to contact said sample with said hydrogen fluoride gas; and (d) resolved solution tray means provided in said sealed container for receiving resolved solution from said sample so as to separate said resolved solution from both said sample and said hydrofluoric acid. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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Specification