Resolution device for semiconductor thin films

• US 4,584,886 A
• Filed: 09/25/1984
• Issued: 04/29/1986
• Est. Priority Date: 09/26/1983
• Status: Expired due to Term

• Current Assignee: Kabushiki Kaisha Toshiba (Toshiba Corporation)
• Original Assignee: Kabushiki Kaisha Toshiba (Toshiba Corporation)
• Inventors: Matsunaga, Hideki, Okada, Akira, Hirate, Naoyuki
• Primary Examiner(s): Levy, Stewart J.
• Assistant Examiner(s): NOLAND, THOMAS
• Application Number:
  US06/654,216
• Time in Patent Office: 581 Days
• Field of Search: 73/863, 73/863.21, 73/864.91, 422/298, 422/299, 356/36, 356/37
• US Class Current: 73/863
• CPC Class Codes: G01N 1/40 Concentrating samples
• CPC Class Codes: G01N 1/4044 by chemical techniques; Digestion; Chemical decomposition
• CPC Class Codes: G01N 21/74 using flameless atomising, e.g. graphite furnaces
• CPC Class Codes: H01L 22/12 for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions electrical measurement of diffusions H01L22/14

Abstract

The resolution device for semiconductor films according to the present invention comprises a sealed container, a storage container installed in the sealed container for storing hydrofluoric acid to generate hydrogen fluoride gas, a semiconductor film supporter installed in the sealed container, and a receptacle of resolved solution installed at the bottom of the sealed container for receiving the resolved solution of the semiconductor films. The semiconductor films held by the film supporter are resolved by hydrogen fluoride gas which is generated from the storage container of hydrofluoric acid and has a low impurity content. The resolved solution is collected in the receptacle for resolved solution, and is supplied directly to the flameless atomic absorption spectrophotometer.

Claims

1. A semiconductor film resolution device for manufacturing samples to be used for analyzing ultratrace amounts of impurities in semiconductor films by resolving the films with a resolution reagent gas in a sealed container, comprising:

(a) storage means in said sealed container for storing hydrofluoric acid and for generating hydrogen fluoride gas;

(b) hydrofluoric acid stored in said storage means so as to generate said hydrogen fluoride gas;

(c) means for holding at least one semiconductor film sample within said sealed container so as to contact said sample with said hydrogen fluoride gas; and

(d) resolved solution tray means provided in said sealed container for receiving resolved solution from said sample so as to separate said resolved solution from both said sample and said hydrofluoric acid.

2. A semiconductor film resolution device as claimed in claim 1, wherein said container, said storage means, said means for holding said semiconductor film sample, and said resolved solution tray means are all comprised of polytetrafluoroethylene.

3. A semiconductor film resolution device as claimed in claim 1, wherein said resolved solution tray means comprises a tray divided by partitions into a plurality of solution-receiving receptacles, said tray being arranged in said sealed container such that each solution-receiving receptacle of said plurality receives resolved solution from a predetermined film sample.

4. A semiconductor film resolution device as claimed in claim 1, wherein said storage means comprises means for storing hydrofluoric acid and for generating hydrogen fluoride gas at about room temperature, such that said hydrofluoric acid stored in said storage means is evaporated at a temperature range between about 20°

and 35°

C.

5. A semiconductor film resolution device as claimed in claim 4, wherein said storage means for storing hydrofluoric acid consists essentially of an open storage container provided within said sealed container.

6. A semiconductor film resolution device as claimed in claim 5, wherein said device does not comprise means for heating said hydrofluoric acid.

7. A semiconductor film resolution device as claimed in claim 1, wherein said storage means comprises a storage container, said means for holding said film sample comprises a carrier holding stand, and said resolved solution tray means comprises a resolved solution receiving tray, said solution receiving tray being placed on said carrier holding stand below said film sample and said storage container being placed beside said carrier holding stand in said sealed container, such that (a) said hydrogen fluoride gas can pass from said storage container to said carrier holding stand and into contact with said film sample and (b) resolved solution can separate from said film sample and be received in said receiving tray.