Ion implantation source and device
First Claim
1. Ion source apparatus for providing ions to be used for implantation of said ions in a surface, said apparatus being adapted to be contained in an evacuable structure, said apparatus comprising:
- a spark gap comprising a pair of electrodes;
means for energizing said electrodes to produce a plasma in a region around said gap from one of said electrodes;
extraction means for extracting ions form said plasma whereby said extracted ions are available for use for ion implantation;
magnetic means disposed and arranged to confine and magnetically insulate said plasma, and direct it toward said extraction means;
pulsing means causing said first name means to energize said electrodes in time-spaced pulses; and
pulsing means means to apply to said plasma an extraction potential relative to said extraction means in time-spaced pulses.
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Accused Products
Abstract
Ion implantation devices in which the ion source is comprised of one or more vacuum spark gaps arranged to create a plasma and manipulated using magnetic fields are described. Each spark gap is comprised of a point electrode and a surface electrode with the plasma being generated from the surface electrode when a spark is initiated across the gap. A plurality of these spark gaps are coupled to a magnetically insulated ion diode. The spark gaps are arrayed around the azimuth of the ion diode so that plasma flows in and out of the diode along the lines of the magnetic field. The method of arraying the gaps results in an efficient, controllable, high density manner with extended pulse length. A second embodiment of these principles results in an advantageous implantation source using permanent magnets rather than grids. The spark gaps permit ion source versatility in that a wide variety of solid surfaces can be used as ion sources.
47 Citations
22 Claims
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1. Ion source apparatus for providing ions to be used for implantation of said ions in a surface, said apparatus being adapted to be contained in an evacuable structure, said apparatus comprising:
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a spark gap comprising a pair of electrodes; means for energizing said electrodes to produce a plasma in a region around said gap from one of said electrodes; extraction means for extracting ions form said plasma whereby said extracted ions are available for use for ion implantation; magnetic means disposed and arranged to confine and magnetically insulate said plasma, and direct it toward said extraction means; pulsing means causing said first name means to energize said electrodes in time-spaced pulses; and pulsing means means to apply to said plasma an extraction potential relative to said extraction means in time-spaced pulses. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A method for generating ions for ion implantation, comprising:
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in a vacuum, utilizing a point electrode and a surface electrode which are spaced from one another to form a spark gap, energizing said spark gap in time-spaced pulses to form a spark that produces ions from the material of the surface electrode in a plasma around the gap, magnetically confining and insulating said plasma, and directing it toward extraction means; and applying an extractive potential to said plasma relative to said extraction means in time-spaced pulses, thereby to extract some of said ions from said plasma and directing them toward a target in which said ions are to be implanted. - View Dependent Claims (18, 19, 20, 21, 22)
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Specification