Method and apparatus for inspecting photomasks to detect defects

• US 4,588,293 A
• Filed: 12/12/1983
• Issued: 05/13/1986
• Est. Priority Date: 12/12/1983
• Status: Expired due to Fees

• Current Assignee: SVG Lithography Systems Incorporated (ASML Holding NV)
• Original Assignee: Perkinelmer Incorporated
• Inventors: Axelrod, Norman N.
• Primary Examiner(s): Kittle, John E.
• Application Number:
  US06/560,679
• Time in Patent Office: 883 Days
• Field of Search: 356/239, 356/71, 350/166
• US Class Current: 356/237.2
• CPC Class Codes: G01N 21/95623 using a spatial filtering method per se G02B
• CPC Class Codes: G03F 1/84 Inspecting

Abstract

The present invention is directed to an improved method and apparatus for detecting defects in photomasks containing features with different arbitrary orientations, said apparatus including in one form therof a detector for detecting orientations of the features so that the optical signals from the features may be suppressed by suitable apparatus such as spatial filtering. The spatial filtering is adjusted electronically based on the determined orientation of the mask features. In one form of the invention the spatial filtering is effected by accepting photodetected signals from only a selected number of photodetectors in a photodetector array, the selection being determined by the orientation of the mask features.

Claims

1. Apparatus for inspecting masks to detect defects comprising:

a mask station for mounting a mask having features to be inspected;

means for projecting radiation through said mask;

means for detecting the orientations of said features;

means for suppressing the optical signal from the features corresponding to the determined orientations of the mask features; and

means for detecting defects in said mask and outputting indicia thereof.

2. Apparatus for inspecting masks to detect defects according to claim 1 wherein said means for detecting the orientations of the mask features comprises a plurality of strip detectors disposed in a cylinder-like configuration so that the axis of the beam is along the axis of the cylinder, whereby orientation is determined by which detectors are energized.

3. Apparatus for inspecting masks to detect defects according to claim 1, wherein the projecting radiation is in the form of a beam having a diameter of less than about 1 mil of an inch.

4. Apparatus for inspecting masks to detect defects according to claim 1 wherein said means for detecting the orientation of the mask features comprises a substantially circular configuration of individual detectors disposed around the optical axis in a pie-like array with the portion near the center removed.

5. Apparatus for inspecting masks to detect defects according to claim 1 wherein said means for detecting the orientation of the mask features comprises a substantially rectangular array of detectors.

6. Apparatus for inspecting masks to detect defects according to claim 1 wherein said means for projecting radiation comprises a first source for projecting an orientation beam to said mask station and a second separate source for projecting a defect detection beam to said mask station.

7. Apparatus for inspecting masks to detect defects according to claim 6 further comprising means for discriminating the signals from the orientation beam and from the defect detection beam.

8. Apparatus for inspecting masks to detect defects according to claim 7 wherein said means for discriminating signals from the orientation beam and from the defect detection beam comprises a beam splitter.

9. Apparatus for inspecting masks to detect defects according to claim 6 wherein said orientation beam and said defect detection beam have different optical wavelengths.

10. Apparatus for inspecting masks to detect defects according to claim 6 wherein said orientation beam and said defect detection beam have different modulation frequencies.

11. Apparatus for inspecting masks to detect defects according to claim 6, wherein the diameters of said beams are less than about 1 mil of an inch respectively, and wherein said means for detecting the orientations and said means for detecting defects comprises an array of detectors mounted adjacent said mask, and means for gating said array of detectors according to the orientation of the regularly shaped mask features, and means for detecting defects in said mask using said gated array of detectors.

12. Apparatus for inspecting masks to detect defects comprising:

a mask station for mounting a mask having features to be inspected;

source means for projecting radiation through said mask;

means for forming an orientation beam;

means for forming a defect detection beam;

a controller;

means for detecting the orientation of the mask features and outputting a corresponding signal to said controller using said orientation beam; and

means for detecting defects in said mask and outputting indicia thereof using said defect detection beam, said controller controlling said means for detecting defects corresponding to the orientation of the mask features.

13. Apparatus for inspecting masks to detect defects according to claim 12 wherein said means for detecting the orientation of the mask features comprises a plurality of strip detectors disposed in a cylinder-like configuration so that the axis of the beam is along the axis of the cylinder, whereby orientation is determined by which detectors are energized.

14. Apparatus for inspecting masks to detect defects according to claim 12, wherein the diameters of said beams are less than about 1 mil of an inch, respectively.

15. Apparatus for inspecting masks to detect defects according to claim 12 wherein said means for detecting the orientation of the mask features comprises a substantially circular configuration of individual detectors disposed around the optical axis in a pie-like array with the portion near the center removed.

16. Apparatus for inspecting masks to detect defects according to claim 12 wherein said means for detecting the orientation of the mask features comprises a substantially rectangular array of detectors.

17. Apparatus for inspecting masks to detect defects according to claim 12 wherein said source means comprises a first source for projecting the orientation beam to said mask station and a second separate source for projecting the defect detection beam to said mask station.

18. Apparatus for inspecting masks to detect defects according to claim 12 further comprising means for discriminating the signals from the orientation beam and from the defect detection beam.

19. Apparatus for inspecting masks to detect defects according to claim 18 wherein said means for discriminating signals from the orientation beam and from the defect detection beam comprises a beam splitter.

20. Apparatus for inspecting masks to detect defects according to claim 12 wherein said orientation beam and said defect detection beam have different optical wavelengths.

21. Apparatus for inspecting masks to detect defects according to claim 12 wherein said orientation beam and said defect detection beam have different modulation frequencies.

22. Apparatus for inspecting masks to detect defects according to claim 12, wherein the diameters of said beams are less than about 1 mil of an inch respectively, and wherein said means for detecting the orientation and said means for detecting defects comprise an array of detectors mounted adjacent said mask, and means for gating said array of detectors according to the orientation of the regularly shaped mask features, and means for detecting defects in said mask using said gated array of detectors.

23. Apparatus for inspecting masks to detect defects comrising:

a mask station for mounting a mask having features to be inspected;

source means for projecting radiation through said mask;

means for forming an orientation beam;

means for forming a defect detection beam;

a controller;

a transform lens, mounted in the path of said radiation, for focusing the radiation transmitted through said mask in the transform plane of said mask;

means for detecting the orientation of the mask features using said orientation beam and outputting a corresponding signal to said controller; and

means for detecting defects in said mask using said defect detection beam and outputting indicia thereof, said controller controlling said means for detecting defects corresponding to the orientation of the mask features.

24. Apparatus for inspecting masks to detect defects acording to claim 23 wherein said means for detecting the orientation of the mask features comprises a plurality of strip detectors disposed in a cylinder-like configuration so that the axis of the beam is along the axis of the cylinder, whereby orientation is determined by which detectors are energized.

25. Apparatus for inspecting masks to detect defects according to claim 23, wherein the diameters of said beams are less than about 1 mil of an inch, respectively.

26. Apparatus for inspecting masks to detect defects according to claim 23 wherein said means for detecting the orientation of the mask features comprises a substantially circular configuration of individual detectors disposed around the optical axis in a pie-like array with the portion near the center removed.

27. Apparatus for inspecting masks to detect defects according to claim 23 wherein said means for detecting the orientation of the mask features comprises a substantially rectangular array of detectors.

28. Apparatus for inspecting masks to detect defects according to claim 23 wherein said source means comprises a first source for projecting the orientation beam to said mask station and a second separate source for projecting the defect detection beam to said mask station.

29. Apparatus for inspecting masks to detect defects according to claim 23 further comprising means for discriminating the signals from the orientation beam and from the defect detection beam.

30. Apparatus for inspecting masks to detect defects according to claim 29 wherein said means for discriminating signals from the orientation beam and from the defect detection beam comprises a beam-splitter.

31. Apparatus for inspecting masks to detect defects according to claim 23 wherein said orientation beam and said defect detection beam have different optical wavelengths.

32. Apparatus for inspecting masks to detect defects according to claim 23 wherein said orientation beam and said defect detection beam have different modulation frequencies.

33. Apparatus for inspecting masks to detect defects according to claim 23, wherein the diameters of said beams are less than about 1 mil of an inch respectively, and wherein said means for detecting the orientation and said means for detecting defects comprises an array of detectors mounted adjacent said mask, means for gating said array of detectors according to the orientation of the regularly shaped mask features, and means for detecting defects in said mask using said gated array of detectors.

34. Apparatus for inspecting masks to detect defects according to claim 23 further comprising a second distinguishable defect detection beam for detecting equivalent mask areas with respect to the first defect detection beam, and wherein said means for detecting defects in said mask comprises means for detecting defects in a first area of said mask using said first defect detection beam and means for detecting defects in a second equivalent area of said mask using said second defect detection beam.

35. Apparatus for inspecting masks to detect defects comprising:

an optical system having a Fourier transform plane;

means for mounting a mask having regularly shaped mask features in said optical system;

means mounted substantially in said transform plane for suppressing the regularly shaped mask features and passing light tracings of defects;

means for detecting the orientation of the regularly shaped mask features;

means for adjusting the means for suppressing the regularly shaped masked features based on the determined orientation of the mask features; and

means for detecting said passed light to produce an output indicative of the presence of defects.

36. Apparatus for inspecting masks to detect defects comprising:

an optical system having a Fourier transform plane;

means for mounting a mask having regularly shaped mask features in said optical system;

an approximate form factor intensity spatial filter mounted substantially in said transform plane for suppressing the regularly shaped masked features and passing light tracings of defects;

means for detecting the orientation of the mask features;

means for adjusting said spatial filter based on the determined orientation of the mask features;

means for detecting said passed light to produce an output; and

means for utilizing said output to generate indicia of defects in said mask.

37. Method of detecting defects in a photomask containing circuit elements, comprising the steps of:

mounting a mask having features to be inspected in a mask station;

projecting radiation through said mask;

detecting the orientations of said features;

suppressing the optical signal from the features corresponding to the determined orientation of the mask features; and

detecting defects in said mask and outputting indicia thereof.

38. Method of detecting defects in a photomask containing circuit elements, comprising the steps of:

mounting a mask having features to be inspected in a mask station;

projecting radiation through said mask;

forming an orientation beam;

forming a defect detection beam;

detecting the orientation of the mask features and outputting a corresponding signal to a controller using said orientation beam; and

detecting defects in said mask and outputting indicia thereof using said defect detection beam which is controlled by said controller corresponding to the orientation of the mask features.

39. Method of detecting defects in a photomask containing circuit elements, comprising the steps of:

mounting a mask having features to be inspected in a mask station;

projecting radiation through said mask;

forming an orientation beam;

forming a defect detection beam;

mounting a transform lens in the path of said radiation for focusing the radiation transmitted through said mask in the transform plane of said mask;

detecting the orientation of the mask features using said orientation beam and outputting a corresponding signal to a controller; and

detecting defects in said mask using said defect detection beam controlled by said controller corresponding to the orientation of the mask features and outputting indicia thereof.

40. Method of detecting defects in a photomask containing circuit elements, comprising the steps of:

mounting a mask having regularly shaped mask features in a optical system having a Fourier transform plane;

mounting an approximate form factor intensity spatial filter substantially in said transform plane for suppressing the regularly shaped masked features and passing light tracings of defects;

detecting the orientation of the mask features;

adjusting said spatial filter based on the determined orientation of the mask features;

detecting said passed light to produce an output; and

utilizing said output to generate indicia of defects in said mask.