Mask feed method and apparatus for exposure replicate systems

• US 4,598,242 A
• Filed: 07/03/1984
• Issued: 07/01/1986
• Est. Priority Date: 07/04/1983
• Status: Expired due to Term

• Current Assignee: Nikon Corporation
• Original Assignee: Nippon Kogaku KK (Nikon Corporation)
• Inventors: Hayashi, Yutaka, Izawa, Hisao
• Primary Examiner(s): NOT, DEFINED
• Application Number:
  US06/627,449
• Time in Patent Office: 728 Days
• Field of Search: 318/640, 318/577, 318/480, 250/201
• US Class Current: 318/640
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/70741 Handling masks outside exposure position, e.g. reticle libraries
• CPC Class Codes: G03F 7/70866 of mask or workpiece

Abstract

A mask feed method and apparatus for deeding and setting with a high degree of positional accuracy a circuit pattern printing mask in a proximity exposure replicate system for printing integrated circuit patterns on a semiconductor wafer. Arranged on the same stage but separated from a wafer chuck is a mask station on which a mask is set a position different from the exposure position and fed to a mask holder at the exposure position for mask feeding purposes. The mask station is provided with its own displacing means for aligning purposes.

Thus, the required movements for mask feeding and alignment purposes are effected by a wafer transfer mechanism.

Claims

1. In an exposure replicate system wherein an object is mounted on an object station on a two-dimensionally movable stage and a mask containing a predetermined pattern to be placed on the object by exposure printing is held opposite to the object at a predetermined distance therefrom by mask holding means, the method of feeding the mask to the mask holding means comprising the steps of:

(a) positioning said stage at a first moving position where said object station is opposed to said mask holding means;

(b) mounting said mask on a mask station arranged on said stage at a different position from said object station;

(c) moving said stage, along with said mask station and said object station, from said first moving position to a second moving position where said mask is opposed to said mask holding means;

(d) displacing said mask station so as to make a pre-alignment of said mask with respect to said system; and

(e) transferring said prealigned mask from said mask station onto said mask holding means.

2. A method according to claim 1, further comprising the step of displacing said mask holding means so as to make a fine alignment of said mask transferred onto said mask holding means with respect to said system.

3. A method according to claim 1, wherein said step (c) comprises the steps of displacing said stage for making a prealignment involving planar linear displacements of said mask, and displacing said mask station with respect to said stage for making another prealignment involving planar rotary movements and a vertical displacement of said mask.

4. A method according to claim 1, wherein said step (c) comprises the steps of detecting the deviation of fiducial mark means formed on said mask with respect to positional reference means preliminarily formed in said system, and aligning said fiducial mark means of said mask with said positional reference means in accordance with said detected deviation.

5. A method according to claim 4, further comprising the step of making a fine alignment of said mask transferred onto said mask holding means with respect to said system in accordance with said positional reference means and said fiducial mark means of said mask.

6. In an exposure replicate system wherein a two-dimensionally movable stage is provided for carrying an object and a mask containing a predetermined pattern to be placed on the object by exposure printing is held opposite to the object at a predetermined distance therefrom by mask holding means, the method of feeding the mask to the mask holding means comprising the steps of:

(a) positioning said stage at a first moving position where a mask station arranged on said stage is deviated from said mask holding means at a direction of the movement of said stage;

(b) mounting said mask on a mask station;

(c) moving said stage, along with said mask station, from said first moving position to a second moving position where said mask is opposed to said mask holding means;

(d) displacing said mask station so as take a prealignment of said mask with respect to said system; and

(e) transferring said prealigned mask from said mask station onto said mask holding means.

7. In an exposure replicate system wherein an object mounted on first station means on a two-dimensionally movable stage and a mask containing a predetermined pattern to be placed on the object by exposure printing is held opposite to the object at a predetermined distance therefrom by mask holding means, a mask feed apparatus for feeding the mask to the mask holding means comprising:

(a) second station means supporting said mask and movable along with said stage as a unit, said first and second station means being arranged on said stage at positions different from each other;

(b) actuating means for moving said stage between a first moving position, where said first station means is opposed to said mask holding means, and a second moving position, where said second station means is opposed to said mask holding means;

(c) detecting means having predetermined positional reference means, for detecting positional deviation of said mask on said second station means with respect to said positional reference means when said stage is moved into said second moving position;

(d) control means responsive to said positional deviations detected by said detecting means to displace said second station means and thereby align said mask with said positional reference means; and

(e) means for transferring said mask aligned with said positional reference means onto said mask holding means.

8. An apparatus according to claim 7, wherein said detecting means detects deviations of said mask held on said mask holding means, and wherein said system further comprises another control means for displacing said mask holding means in accordance with said deviations detected by said detecting means so as to align said mask held on said mask holding means with said positional reference means.