Process for producing micro Fresnel lens

• US 4,609,259 A
• Filed: 11/09/1984
• Issued: 09/02/1986
• Est. Priority Date: 11/11/1983
• Status: Expired due to Fees

• Current Assignee: Pioneer Electronics (USA) Incorporated (Pioneer Corporation)
• Original Assignee: Pioneer Electronics (USA) Incorporated (Pioneer Corporation)
• Inventors: Suzuki, Shinichi, Niriki, Takashi, Suemitsu, Takashi
• Primary Examiner(s): Corbin, John K.
• Assistant Examiner(s): Ben, Loha
• Application Number:
  US06/669,792
• Time in Patent Office: 662 Days
• Field of Search: 350/320, 350/417, 350/162.16, 156/904, 430/942, 430/296
• US Class Current: 355/53
• CPC Class Codes: G02B 5/1876 Diffractive Fresnel lenses; Zone plates; Kinoforms G02B5/1842, G02B5/1847 take precedence; optical systems having diffractive correction means G02B27/0037; Fresnel lenses operating by refraction G02B3/08
• CPC Class Codes: G02B 5/1885 Arranged as a periodic array
• CPC Class Codes: G03F 7/001 Phase modulating patterns, e.g. refractive index patterns

Abstract

A process for producing a micro Fresnel lens comprises the following steps: moving either a substrate coated with a resist layer for providing the micro Fresnel lens or a source of actinic radiation such as electron beam for exposing the resist layer relative to each other in a fixed direction; scanning linearly the resist coat with the actinic radiation in a direction perpendicular to the direction of the relative movement; during the scanning operation, performing exposure to the actinic radiation or interrupting or overlapping the application of the actinic radiation so as to form a latent image in an area corresponding to the grooved surface of the micro Fresnel lens within a predetermined width; repeating the above procedures in a direction perpendicular to that of the relative movement of the substrate and the source of actinic radiation; and developing the exposed resist layer to provide a micro Fresnel lens having the desired grooved surface.

Claims

1. A process for producing a micro Fresnel lens having a grooved surface from a substrate coated with a resist layer comprising the following steps:

moving a substrate coated with a resist layer in a first direction relative to a source of actinic radiation;

scanning said actinic radiation linearly in a direction perpendicular to said first direction on said resist coat within a first predetermined width while interrupting and overlapping application of said actinic radiation to form a latent image of a portion of a micro Fresnel lens within said first predetermined width;

indexing said substrate with respect to said source of actinic radiation to scan a second portion of said substrate adjacent said first predetermined width in the form of a second predetermined width;

repeating said scanning and indexing steps until the entire latent image of said lens is formed; and

developing the exposed resist layer to form the grooved surface of said Fresnel lens.

2. The process of claim 1, wherein said actinic radiation comprises electron beam.

3. A process for producing a micro Fresnel lens having a grooved surface from a substrate coated with a resist layer comprising the following steps:

moving a substrate coated with a resist layer in a fixed direction relative to a source of actinic radiation;

scanning linearly the resist coat with the actinic radiation in a direction perpendicular to the direction of the movement of the substrate;

during said scanning, exposing the coated substrate to the actinic radiation, interrupting, and overlapping the application of said actinic radiation so as to form a latent image in an area corresponding to the grooved surface of the micro Fresnel lens within a predetermined width;

repeating the above procedures in a direction perpendicular to that of the movement of said substrate; and

developing the exposed resist layer to provide a micro Fresnel lens having the grooved surface.

4. A process for producing a micro Fresnel lens having a grooved surface from a substrate coated with a resist layer comprising the following steps:

moving, in a fixed direction, a source of actinic radiation for exposing a resist layer relative to a substrate coated with said resist layer for providing the micro Fresnel lens;

scanning linearly the resist coat with the actinic radiation in a direction perpendicular to the direction of the movement of said source of actinic radiation;

during said scanning, exposing the coated substrate to the actinic radiation, interrupting and overlapping the application of said actinic radiation so as to form a latent image in an area corresponding to the grooved surface of the micro Fresnel lens within a predetermined width;

repeating the above procedures in a direction perpendicular to that of the movement of said source of actinic radiation; and

developing the exposed resist layer to provide a micro Fresnel lens having the grooved surface.