Electrode for plasma etching system
First Claim
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1. An electrode for plasma etching including a source of process gas to be delivered to a reactor etching chamber comprising:
- (a) a plurality of concentric rings surrounding a center disc and disposed to rest inside each other;
(b) said rings and said disc forming annular plenum chambers therebetween; and
said rings and disc further providing a plurality of openings therein leading from said source of process gas to said plenums; and
(c) said rings being spaced to provide annular slits therebetween for transferring gas from said plenums into said reactor etching chamber.
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Abstract
An electrode includes a plurality of nested concentric rings forming plenum chambers. Process gas is fed into the plenum chambers through capillary tubes. The gas is then delivered through slits between the rings into a plasma etching reactor.
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Citations
7 Claims
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1. An electrode for plasma etching including a source of process gas to be delivered to a reactor etching chamber comprising:
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(a) a plurality of concentric rings surrounding a center disc and disposed to rest inside each other; (b) said rings and said disc forming annular plenum chambers therebetween; and
said rings and disc further providing a plurality of openings therein leading from said source of process gas to said plenums; and(c) said rings being spaced to provide annular slits therebetween for transferring gas from said plenums into said reactor etching chamber. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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Specification