Electrode for plasma etching system

• US 4,612,077 A
• Filed: 07/29/1985
• Issued: 09/16/1986
• Est. Priority Date: 07/29/1985
• Status: Expired due to Term

• Current Assignee: Lam Research Corporation
• Original Assignee: Perkinelmer Incorporated
• Inventors: Smith, Donald L., Tracy, David H.
• Primary Examiner(s): Powell, William A.
• Application Number:
  US06/759,819
• Time in Patent Office: 414 Days
• Field of Search: 156/345, 156/643, 156/646, 156/656, 156/659.1, 204/164, 204/192 E, 204/298, 427/38, 427/39, 118/715, 118/732, 118/50.1, 118/620, 219/121 PU
• US Class Current: 156/345.34
• CPC Class Codes: H01J 37/3244 Gas supply means

Abstract

An electrode includes a plurality of nested concentric rings forming plenum chambers. Process gas is fed into the plenum chambers through capillary tubes. The gas is then delivered through slits between the rings into a plasma etching reactor.

Claims

1. An electrode for plasma etching including a source of process gas to be delivered to a reactor etching chamber comprising:

(a) a plurality of concentric rings surrounding a center disc and disposed to rest inside each other;

(b) said rings and said disc forming annular plenum chambers therebetween; and

said rings and disc further providing a plurality of openings therein leading from said source of process gas to said plenums; and

(c) said rings being spaced to provide annular slits therebetween for transferring gas from said plenums into said reactor etching chamber.

2. An electrode as set forth in claim 1 wherein said center disc rests on the innermost ring, includes openings therein, and forms a plenum chamber and slit opening with said innermost ring.

3. An electrode as set forth in claim 1 wherein said plurality of openings include capillary tubes therein to control the flow of gas into said plenums.

4. An electrode as set forth in claim 2 wherein the outermost ring is connected to a liquid cooled plate to form a chamber including said process gas to be delivered through said openings, said plenums and said annular slits to said reactor chamber.

5. An electrode as set forth in claim 4 wherein said electrode comprises magnesium.

6. An electrode as set forth in claim 5 wherein said chamber comprises a plurality of slots milled in said liquid cooled plate.

7. An electrode as set forth in claim 6 wherein said slots comprise four in number disposed at right angles to each other and extending across all of said capillary tubes.