Semiconductor etching process

• US 4,613,417 A
• Filed: 12/28/1984
• Issued: 09/23/1986
• Est. Priority Date: 12/28/1984
• Status: Expired due to Term

• Current Assignee: Bell Telephone Laboratories, Inc. (Nokia Corporation)
• Original Assignee: AT&T, Inc.
• Inventors: Laskowski, Edward J., Wolowodiuk, Catherine
• Primary Examiner(s): Tufariello, T. M.
• Application Number:
  US06/687,129
• Time in Patent Office: 634 Days
• Field of Search: 204/129.75, 204/129.85, 204/129.95
• US Class Current: 257/79
• CPC Class Codes: C25F 3/12 of semiconducting materials
• CPC Class Codes: H01L 21/30635 of AIIIBV compounds

Abstract

A photoelectrochemical etching process is described for n-type and semi-insulating III-V semiconductor compounds that contain aluminum or indium (AlGaAs, InGaAs) in which a non-aqueous electrolyte is used. High etch rates are achieved without harm to exposed metallization or p-layers. An exemplatory application is the separation of chips (e.g., LED chips) after wafer processing.

Claims

1. A process for fabricating a device comprising n-type or semi-insulating III-V semiconductor compound comprising aluminum or indium comprising the step of photoelectrochemically etching the III-V semiconductor compound by passing current through the III-V semiconductor compound, electrolytic solution with electrical conductivity greater than 0.00001 mho/cm and anode in which the photoelectrochemical etching procedure further comprises:

a. applying a potential to the semiconductor which is between the maximum potential of the valence band of the semiconductor in the electrolytic solution and the minimum potential of the conduction band of the semiconductor in the electrolytic solution;

b. illuminating the part of the surface of the semiconductor to be etched with radiation of sufficient energy to produce holes in the valence band;

characterized in that

c. the electrolytic solution comprises nonaqueous solvent with less than 10 weight percent water.

2. The process of claim 1 in which the nonaqueous solvent comprises less than 5 weight percent water.

3. The process of claim 2 in which the nonaqueous solvent comprises less than one weight percent water.

4. The process of claim 1 in which the nonaqueous solvent comprises polar organic liquid.

5. The process of claim 4 in which the nonaqueous solvent comprises polar organic liquid selected from the group consisting of alcohols with up to 10 carbon atoms.

6. The process of claim 5 in which the liquid consists of methanol.

7. The process of claim 5 in which the liquid is acetonitrile.

8. The process of claim 1 in which the electrolytic solution comprises at least one substance to increase the conductivity of the electrolytic solution.

9. The process of claim 8 in which the substance is selected from the group consisting of HCl, H₂ SO₄, phosphoric acid, HF, tetraalkyl ammonium salt with up to 24 carbon atoms and sodium alkoxide with up to 10 carbon atoms.

10. The process of claim 9 in which the tetraalkyl ammonium salt is tetrabutyl ammonium bromide.

11. The process of claim 9 in which the sodium alkoxide is sodium methoxide.

12. The process of claim 1 in which the III-V compound semiconductor is selected from the group consisting of AlGaAs, InAlAs, InGaAs, InGaAsP, InGaAlAs, AlGaAsSb, AlGaPSb, AlInPAs, AlInPSB and AlInAsSb.

13. The process of claim 12 in which the III-V compound semiconductor is AlGaAs.

14. The process of claim 13 in which the composition of the AlGaAs varies from Al₀.1 Ga₀.9 As to Al₀.9 Ga₀.1 As.

15. The process of claim 14 in which the composition is approximately Al₀.3 Ga₀.7 As and the potential is between -0.7 and +0.5 volts relative to a saturated calomel electrode and the electrolytic solution comprises methanol.

16. The device made in accordance with the process of claim 1.

17. The device of claim 16 in which the device is a light emitting diode.