Process for fabricating glass tooling

• US 4,632,898 A
• Filed: 04/15/1985
• Issued: 12/30/1986
• Est. Priority Date: 04/15/1985
• Status: Expired due to Fees

• Current Assignee: Eastman Kodak Company
• Original Assignee: Eastman Kodak Company
• Inventors: Fister, Robert V., Pledger, James R.
• Primary Examiner(s): Kittle, John E.
• Assistant Examiner(s): Ryan, Patrick J.
• Application Number:
  US06/723,411
• Time in Patent Office: 624 Days
• Field of Search: 430/323, 430/331, 430/313, 430/495, 430/942, 156/643, 156/646, 156/652, 156/659.1, 156/642
• US Class Current: 430/313
• CPC Class Codes: G03F 7/00 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor using photoresist structures for special production processes, see the relevant places, e.g. B44C, H01L, e.g. H01L21/00, H05K
• CPC Class Codes: G11B 7/261 Preparing a master, e.g. exposing photoresist, electroforming
• CPC Class Codes: Y10S 430/143 Electron beam

Abstract

The present disclosure relates to a process for fabricating glass tooling with a featured surface. The method entails the steps of coating a polished surface of a glass blank with a continuous metal coating. A photoresist is applied, exposed, and developed in a desired pattern. Uncovered metal is etched away and the remaining metal provides a mask. The uncovered glass is plasma etched to feature the surface of the glass blank.

Claims

1. A process for fabricating glass tooling with a featured surface, said process comprising the steps of:

coating a polished surface of a glass blank with a continuous metal coating;

applying a photoresist layer to the metal coating;

exposing the photoresist layer so as to create therein a desired pattern latent image;

developing the latent image, leaving certain portions of the metal coating uncovered and other portions thereof still covered by remaining portions of the photoresist layer;

etching away said uncovered portions of the metal coating, leaving corresponding portions of the glass blank uncovered and other portions thereof covered by a mask including said other portions of the metal coating still covered by said remaining portions of the photoresist layer;

removing said remaining portions of the photoresist layer from said other portions of the metal coating;

plasma etching into said uncovered portions of the glass blank while said other portions thereof are covered by said other portions of the metal coating; and

removing said other portions of the metal coating from said other portions of the glass blank;

thereby leaving the glass blank etched in accordance with said desired pattern and clear of said mask, to provide said glass tooling with said featured surface for use as a durable master in a subsequent molding process.

2. The process set forth in claim 1 wherein the metal coating comprises chrome.

3. The process set forth in claim 1 wherein the metal coating is vacuum coated, and is about 800 Å

to 1000 Å

thick.

4. The process set forth in claim 3 wherein the metal coating comprises chrome.

5. The process set forth in claim 1 wherein the plasma etching is done with argon gas.

6. The process set forth in claim 5 wherein the metal coating comprises chrome.

7. The process set forth in claim 1 wherein the photoresist layer comprises a positive working material applied by spin coating.

8. The process set forth in claim 1 wherein the exposing is done by focused laser light.