Hollow cathode

• US 4,633,129 A
• Filed: 04/30/1985
• Issued: 12/30/1986
• Est. Priority Date: 04/30/1985
• Status: Expired due to Fees

• Current Assignee: International Business Machines Corporation
• Original Assignee: International Business Machines Corporation
• Inventors: Rossnagel, Stephen M., Kaufman, Harold R., Cuomo, Jerome J.
• Primary Examiner(s): Levy, Stewart J.
• Assistant Examiner(s): ROSKOS, JOSEPH
• Application Number:
  US06/729,028
• Time in Patent Office: 609 Days
• Field of Search: 313/153, 313/103 CM, 313/356, 313/346 R, 313/336, 313/362.1, 313/313, 313/339
• US Class Current: 313/153
• CPC Class Codes: H01J 1/025 Hollow cathodes

Abstract

A long life high current density hollow cathode electron beam source for use in various E-beam apparatus which uses an ionizable gas within the hollow cathode. Bombardment of an electron emissive surface within the hollow cathode by energetic gas ions causes electrons to be emitted by secondary emission rather than thermionic emission effects. Once initialized by an external ionization voltage the device is essentially self sustaining and operates near room temperature, rather than at thermionic emission temperatures, and with reduced voltages.

Claims

1. In an electron beam apparatus, the improvement which comprises a hollow cathode structure comprising an outer enclosure, having at one end thereof a wall, said wall having an aperture therethrough for electron beam emission, a second wall at the opposite end of said enclosure, the enclosure and walls defining an interior chamber, means for admitting an ionizable gas into said chamber, the interior surface of said chamber, exclusive of said end walls, having a low work function electron emissive coating thereon which readily emits electrons under bombardment by ions from said gas, and means for ionizing the gas within said chamber whereby high energy electrons are emitted from said surface by secondary emission effects and low energy electrons released by collision between said high energy electrons and gas ions are emitted through the aperture.

2. An electron beam apparatus as set forth in claim 1, further including means for initiating operation of the device including a(n external) high-voltage discharge for initially ionizing the gas within the said chamber whereby the gas ions collide with said electron emitting surface to release high energy electrons therefrom, said high energy electrons in turn colliding with gas molecules within said chamber to, in effect, sustain the ionized condition of said gas even after the initial high voltage is removed.

3. An electron beam apparatus as set forth in claim 2 wherein the ionizable gas is selected from the group consisting of hydrogen, helium, Ne and combinations of these and reactive gases including O₂, N₂ and Ar.

4. An electron been apparatus as set forth in claim 3 wherein the electron emissive surface is comprised of a layer of a material selected from the group consisting of oxides and halides including MgO, MgF₂, NaCl, ZnO, Al₂ O₃, SiO₂, BaOSrO and combinations of these and other oxides and halides.

5. An electron beam apparatus as set forth in claim 2 wherein the secondary electron emissive surface is located on those surfaces of said chamber which produce high energy electrons leaving said surfaces in a direction substantially normal to the electron beam emanating from said hollow cathode structure.

6. In a electron beam apparatus, the improvement which comprises a hollow cathode structure comprising an outer enclosure, having at one end thereof a wall, said wall having an aperture therethrough for electron beam emission, a second wall at the opposite end of said enclosure, means for admitting an ionizable gas into said chamber, the enclosure and walls defining an interior chamber, at best, some of the interior surfaces of said chamber having a low work function secondary electron emissive coating thereon which readily emits electrons under bombardment by ions from said gas, means for admitting an ionizable gas plasma into said interior chamber, and means for establishing a strong magnetic field transverse to electron beam flow through said aperture in said one end wall whereby energetic electrons are substantially prohibited from passing through said aperture.

7. An electron beam apparatus as set forth in claim 6 wherein said magnetic field establishing means comprises a pole piece located within said aperature defining an opening for ionized gas and electron flow between itself and the walls of said aperature and means for supplying a strong magnetic field to said pole piece.

8. An electron beam apparatus as set forth in claim 7 wherein said means for supplying a strong magnetic field comprises a permanent magnet located within said hollow cathode internal chamber and attached to provide a low permeability path to said pole piece at one end and to the structure defining said hollow cathode at the other.

9. An electron beam apparatus as set forth in claim 6, further including means for initiating operation of the device including a high-voltage discharge for initially ionizing the gas within the said chamber whereby the gas ions collide with said electron emitting surface to release high energy electrons therefrom, said high energy electrons in turn colliding with gas molecules within said chamber to, in effect, sustain the ionized condition of said gas even after the initial high voltage is removed.