Process for the production images using sequentially gaseous polymerizing agents and photocuring

• US 4,634,644 A
• Filed: 12/10/1984
• Issued: 01/06/1987
• Est. Priority Date: 12/20/1983
• Status: Expired due to Fees

• Current Assignee: Ciba-Geigy Corporation (Novartis Ag)
• Original Assignee: Ciba-Geigy Corporation (Novartis Ag)
• Inventors: Irving, Edward, Smith, Terence J.
• Primary Examiner(s): Martin, Roland E.
• Assistant Examiner(s): Hamilton, Cynthia
• Application Number:
  US06/679,973
• Time in Patent Office: 757 Days
• Field of Search: 430/327, 430/325, 430/280, 430/270, 430/286, 430/287, 430/18, 528/113, 522/103, 522/162
• US Class Current: 430/18
• CPC Class Codes: G03F 7/168 Finishing the coated layer, e.g. drying, baking, soaking
• CPC Class Codes: H05K 3/0073 Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces

Abstract

A layer of a liquid composition containing a residue that is polymerizable on contact with a gaseous polymerizing agent and a photocurable residue, which residues may be on the same or different molecules, is contained with a gaseous polymerizing agent so that the layer solidifies but remains photocurable. Subsequently the solidified layer is exposed to actinic radiation in a predetermined pattern and those parts of the layer that are not photocured are removed by treatment with a suitable solvent.

Typical polymerizable residues include cyanoacrylates that polymerize on exposure to water vapor, ammonia, or an amine. Typical photocurable residues include acrylates, and methacrylates.

The process is suitable for the manufacture of printing plates and printed circuits.

Claims

1. A process for the production of an image which comprises

(a) applying to a substrate a layer of a liquid composition containing a residue that is polymerizable on contact with a gaseous polymerizing agent, and a photocurable residue,

(b) contacting the composition with a gaseous polymerizing agent such that the layer solidifies but remains photocurable,

(c) exposing the solidified layer to actinic radiation in a predetermined pattern such that exposed parts of the layer are photocured, and

(d) removing those parts of the layer which have not become substantially photocured by treatment with a solvent therefor.

2. A process according to claim 1, in which the liquid composition comprises a substance having polymerizable groups and photocurable groups on the same molecule.

3. A process according to claim 1, in which the liquid composition comprises a mixture of one or more materials that are polymerizable on contact with the gaseous polymerizing agent, together with one or more photocurable materials.

4. A process according to claim 1, in which the polymerizable residue comprises a single species or two or more similar species which polymerize under the catalytic influence of the gaseous polymerizing agent.

5. A process according to claim 4, in which the polymerizable residue and its gaseous polymerizing agent are selected from the group consisting of

(i) a cyanoacrylate with water vapour, ammonia, or an amine,

(ii) an isocyanate-terminated prepolymer with ammonia or an amine,

(iii) an epoxy resin with boron trifluoride, and

(iv) a phenolic resin with an acid gas.

6. A process according to claim 5, in which the gaseous polymerizing agent is an amine and is methylamine, dimethylamine, trimethylamine, ethylamine, diethylamine, triethylamine, isopropylamine, tert.butylamine, ethanolamine, triethanolamine or N,N-dimethylethanolamine.

7. A process according to claim 5, in which the gaseous polymerizing agent is acidic and is hydrogen chloride, hydrogen bromide, sulfur dioxide or sulfur trioxide.

8. A process according to claim 1, in which the polymerizable residue comprises two or more co-reacting species that are comparatively stable until reaction between them is catalysed or accelerated by the gaseous polymerizing agent.

9. A process according to claim 8, in which the polymerizable residue, and its gaseous polymerizing agent, are selected from the group consisting of

(i) a mixture of a polyol and an isocyanate with ammonia or an amine,

(ii) a polyene-polythiol mixture with ammonia or an amine,

(iii) an epoxy resin-amine mixture with an acid gas,

(iv) an epoxy resin-thiol mixture with ammonia or an amine, and

(v) a mixture of an acrylate or methacrylate and hydrogen peroxide or a hydroperoxide free radical initiator with sulfur dioxide.

10. A process according to claim 9, in which the gaseous polymerizing agent is an amine and is methylamine, dimethylamine, trimethylamine, ethylamine, diethylamine, triethylamine, isopropylamine, tert.butylamine, ethanolamine, triethanolamine, or N,N-dimethylethanolamine.

11. A process according to claim 9, in which the gaseous polymerizing agent is acidic and is hydrogen chloride, hydrogen bromide, sulfur dioxide or sulfur trioxide.

12. A process according to claim 5, in which the polymerizable residue is

(i) a cyanoacrylate of formula ##STR11## in which R² has, at most, 18 carbon atoms and is an alkyl, alkenyl, aralkyl, haloalkyl, cycloalkyl, aryl or alkoxyalkyl group,

(ii) an isocyanate-terminated prepolymer formed by reaction of a polyol, polyamine, or polycarboxylic acid with an aliphatic, cycloaliphatic or aromatic diisocyanate,

(iii) an epoxy resin containing at least two groups of formula ##STR12## directly attached to an atom or atoms of oxygen, nitrogen or sulfur, where either R³ and R⁵ each represent a hydrogen atom, in which case R⁴ denotes a hydrogen atom or a methyl group, or R³ and R⁵ together represent --CH₂ CH₂ --, in which case R⁴ denotes a hydrogen atom,

(iv) an epoxy resin having some or all of the epoxide groups in non-terminal positions,

(v) a phenolic resin that is a resole made from a phenol and an aldehyde.

13. A process according to claim 9, in which the polymerizable residue is

(i) a mixture of an alkylene glycol, a polyoxyalkylene glycol, an alkane triol, a hydroxy group-containing reaction product of an epoxy resin with a carboxylic acid, carboxylic anhydride, phenol, primary or secondary amine, or thiol, pentaerythritol, a hydroxy group-containing polymer of a hydrxoyalkyl acrylate or methacrylate or a copolymer of styrene and allyl alcohol with an aliphatic, cycloaliphatic or aromatic isocyanate,

(ii) a mixture of a polyene having a molecular weight of 50 to 20000 and containing two or more ethylenic or ethynylic bonds capable of participating in a free-radical polymerization reaction, or an epoxy resin having at least two groups of formula III ##STR13## directly attached to an atom or atoms of oxygen, nitrogen or sulfur, where either R³ and R⁵ each represent a hydrogen atom, in which case R⁴ denotes a hydrogen atom or a methyl group, or R³ and R⁵ together represent --CH₂ CH₂ --, in which case R⁴ denotes a hydrogen atom,

or having some or all of the epoxide groups in non-terminal positions, with a polythiol having a molecular weight within the range 50 to 20000 which is an ester of thioglycollic, alpha mercaptopropionic or beta mercaptopropionic acid with a glycol, triol, tetraol, pentaol or hexol,

(iii) a mixture of an epoxy resin having at least two groups of formula III or having some or all of the epoxide groups in non-terminal positions with an alipatic, alicyclic, unsaturated heterocyclic or araliphatic tertiary amine, or

(iv) a mixture of an acrylate or methacrylate monomer which is acrylic or methacrylic acid, or an alkyl acrylate, alkylenediol diacrylate, 1,1,1-trimethylolpropane triacrylate, polypropylene glycol diacrylate, allyl acrylate, or a corresponding methacrylate, with hydrogen peroxide, tert.butyl hydroperoxide, cumene hydroperoxide, or 2,4-dimethyl-2,4-hexane dihydroperoxide.

14. A process according to claim 1, in which the photocurable residue present is one in which cure is effected by direct activation of photosensitive groups through irradiation.

15. A process according to claim 14, in which the residue having photosensitive groups is one having at least two azido, coumarin, stilbene, maleimido, pyridinone, chalcone, propenone, pentadienone, or anthracene groups or acrylic ester groups which are substituted in their 3-position by a group having ethylenic unsaturation or aromaticity in conjugation with an ethylenic double bond of the acrylic group.

16. A process according to claim 1, in which the photocurable residue present is one in which irradiation activates a suitable initiator molecule which then activates a photopolymerizable group.

17. A process according to claim 16, in which the photocurable residue is an epoxide resin, phenolic resin, urea-formaldehyde resin, cyclic ether, cyclic ester, cyclic sulphide, cyclic amine, organosilicon cyclic, a full or a partial ester of acrylic or methacrylic acid with an aliphatic monohydric alcohol, glycol, or higher functional polyol or with a compound containing one or more glycidyl groups, or an ester formed by reaction of a polyepoxide with an adduct of a hydroxyalkyl acrylate or methacrylate with a saturated or unsaturated polycarboxylic acid anhydride.

18. A process according to claim 2, in which the substance having polymerisable and photocurable groups on the same molecule is an epoxide containing a photocurable group, or, together with an isocyanate, a hydroxy compound containing a photocurable group.

19. A process according to claim 1, in which the substrate bearing the liquid composition is placed within a chamber and air in the chamber is replaced by, or saturated with, the gaseous polymerizing agent.

20. A substrate bearing an image produced by a process according to claim 1.