Optical laminar structure

• US 4,639,069 A
• Filed: 06/28/1983
• Issued: 01/27/1987
• Est. Priority Date: 06/30/1982
• Status: Expired due to Term

• Current Assignee: Teijin Limited
• Original Assignee: Teijin Limited
• Inventors: Nishihara, Toshio, Suzuki, Nobuo, Yatabe, Toshiaki
• Primary Examiner(s): Corbin, John K.
• Assistant Examiner(s): Edmondson, David J.
• Application Number:
  US06/508,707
• Time in Patent Office: 1,309 Days
• Field of Search: 350/1.7, 350/1.6, 350/311, 350/166, 428/457, 428/458, 428/412, 428/419, 427/164, 427/160
• US Class Current: 359/360
• CPC Class Codes: G02B 5/282 reflecting for infrared and transparent for visible light, e.g. heat reflectors, laser protection

Abstract

This invention provides an optical laminar structure having an optically selective transmitting function accordant with light wavelength, whereby it is capable of having high transmittance for visible ray and low transmittance for near infrared ray and infrared ray, so that said optical laminar structure can be offered at a low price to expand its applications not only in special optical lines but also in general glazing use.

Claims

1. An optical laminar structure being transparent for visible light and reflective for near infrared light comprising a dielectric layer arranged sandwichlike between thin metal layers, located on a transparent substrate, characterized in that the dielectric layer comprises a 30 nm to 200 nm (300 Å

to 2,000 Å

) thick transparent organic polymer layer with a refractive index in the range of 1.35 to 1.65, the thin metal layer has a thickness of about 4 nm to about 15 nm (about 40 Å

to about 150 Å

) and the transparent substrate is a 0.5 mm to 10 mm thick inorganic glass sheet or a 5 μ

m to 200 μ

m thick organic polymer film.

2. An optical laminar structure as claimed in claim 1 wherein said thin metal layers are respectively sandwiched between a pretreatment layer and a post-treatment layer of titanium, nickel, bismuth, zirconium or silicon.

3. An optical laminar structure as claimed in claim 1, wherein said transparent substrate is a biaxially oriented polyethylene terephthalate film, said thin metal layers are formed of a metal or an alloy comprising silver, gold or copper, and said dielectric layer is formed of an acrylonitrile resin, a polyamide resin, a copolymer of acrylonitrile and styrene, a polystyrene, or a polymethacrylate and has a thickness in the range of 50 nm to 150 nm (500 Å

to 1,500 Å

).

4. An optical laminar structure as claimed in claim 3 wherein said thin metal layers are respectively sandwiched between a pretreatment layer and a post-treatment layer of titanium, nickel, bismuth, zirconium or silicon.

5. A process for making an optical laminar structure being transparent for visible light and reflective for near infrared light, in which a dielectric layer arranged sandwichlike between thin metal layers is located on a transparent substrate, comprising:

(i) depositing on the transparent substrate comprising a 0.5 mm to 10 mm thick inorganic glass sheet or a 5 μ

m to 200 μ

m thick organic polymer film a thin metal layer (a) of thickness about 4 nm to about 15 nm (about 40 Å

to about 150 Å

) by a physical vapour deposition method,

(ii) arranging, on the thin metal layer (A) the dielectric layer (B) of an organic polymer of thickness 30 nm to 200 nm (300 Å

to 2,000 Å

) by coating thereon a solution of said organic polymer, followed by drying; and

(iii) depositing on the dielectric layer (B) a thin metal layer (C) of thickness about 4 nm to about 15 nm (about 40 Å

to about 150 Å

) by a physical vapour deposition method.