MOSFET with reduced bipolar effects

• US 4,639,762 A
• Filed: 04/30/1984
• Issued: 01/27/1987
• Est. Priority Date: 04/30/1984
• Status: Expired due to Term

• Current Assignee: Fairchild Semiconductor Corporation (ON Semiconductor Corporation), RCA Corporation
• Original Assignee: RCA Corporation
• Inventors: Brackelmanns, Norbert W., Neilson, John M. S.
• Primary Examiner(s): Edlow, Martin H.
• Assistant Examiner(s): JACKSON JR, JEROME
• Application Number:
  US06/605,427
• Time in Patent Office: 1,002 Days
• Field of Search: 357/23.8, 357/23.4, 357/20, 357/86, 357/36
• US Class Current: 257/142
• CPC Class Codes: H01L 29/0696 of cellular field-effect devices, e.g. multicellular DMOS transistors or IGBTs
• CPC Class Codes: H01L 29/7802 Vertical DMOS transistors, i.e. VDMOS transistors

Abstract

A MOSFET device comprises a semiconductor wafer which includes a drain region of first conductivity type contiguous with a wafer surface. A diffused body region of second conductivity type extends into the wafer from the wafer surface so as to form a body/drain PN junction which has a polygonally-shaped intercept at the wafer surface. A plurality of source regions of first conductivity type extends into the wafer from the wafer surface within the boundary of the body region. The source regions define a plurality of channel regions, a contact area, and at least one shunt region at the surface of the body region. Each shunt region extends from the contact area to one of the corners of the body/drain PN junction polygonal intercept. A source electrode contacts the body region contact area and each of the source regions adjacent thereto.

Claims

1. An IGFET device comprising:

a semiconductor wafer including a drain region of first conductivity type contiguous with a wafer surface;

a diffused body region of second conductivity type extending into the wafer from said wafer surface so as to form a body/drain PN junction having an intercept at said surface, said intercept having a substantially polygonal shape;

a plurality of source regions of first conductivity type extending into the wafer from said surface within the boundary of the body region, each source region forming a source/body PN junction which is spaced from said body/drain PN junction so as to define a channel region in the body region at said surface, and each of the source/body PN junctions being spaced from each other so as to define, in the body region, at the wafer surface, a contact area and at least one shunt region, each shunt region extending from said contact area to a corner of said polygonally-shaped body/drain PN junction intercept; and

a source electrode which contacts said body region contact area and each of the shunt regions and source regions adjacent thereto.

2. A device in accordance with claim 1 wherein said drain region is contiguous with an opposing wafer surface, and a drain electrode contacts the opposing wafer surface.

3. A device in accordance with claim 1 wherein said contact area is substantially centrally located within said body region.

4. A device in accordance with claim 1 further comprising a fourth region of second conductivity type contiguous with said drain region.

5. A device in accordance with claim 4 wherein said fourth region is contiguous with an opposing wafer surface.

6. A device in accordance with claim 5 further comprising a drain electrode which contacts said fourth region on said opposing wafer surface.

7. A device in accordance with claim 1 wherein said intercept is square-shaped.

8. A device in accordance with claim 7 further comprising a shunt region extending to each corner of said square-shaped intercept.

9. A device in accordance with claim 1 wherein said intercept is hexagonally-shaped.

10. A device in accordance with claim 9 comprising a shunt region extending to each corner of said hexagonally-shaped intercept.

11. A device in accordance with claim 1 further comprising a plurality of said diffused body regions, said source electrode contacting each of said body regions.

12. A device in accordance with claim 1 wherein said body region contact area is of relatively high conductivity compared to said channel regions.