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Inspection method and apparatus for a mask pattern used in semiconductor device fabrication

  • US 4,641,353 A
  • Filed: 09/10/1984
  • Issued: 02/03/1987
  • Est. Priority Date: 09/16/1983
  • Status: Expired due to Term
First Claim
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1. An inspection method for a mask pattern used in semiconductor fabrication which uses an optical system for exposing said mask pattern on a fabricated object and printing said mask pattern;

  • thereon, the inspection method comprising the steps of;

    projecting an optical image of said mask pattern onto an image sensor provided on a stage having said fabricated object mounted thereon;

    converting said optical image into a sensor video signal;

    generating a data video signal from design data used in fabricating said mask pattern, andcomparing said sensor video signal to said data video signal for determining whether said mask pattern is normal.

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