Inspection method and apparatus for a mask pattern used in semiconductor device fabrication
First Claim
1. An inspection method for a mask pattern used in semiconductor fabrication which uses an optical system for exposing said mask pattern on a fabricated object and printing said mask pattern;
- thereon, the inspection method comprising the steps of;
projecting an optical image of said mask pattern onto an image sensor provided on a stage having said fabricated object mounted thereon;
converting said optical image into a sensor video signal;
generating a data video signal from design data used in fabricating said mask pattern, andcomparing said sensor video signal to said data video signal for determining whether said mask pattern is normal.
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Accused Products
Abstract
An inspection method and apparatus for a mask pattern such as a reticle pattern used in the fabrication of a semiconductor device is disclosed. The mask pattern is inspected by an imaging sensor mounted on a stage on which a fabricated object is also mounted. The imaging sensor converts an optical image of the mask pattern which is intended to be exposed on the object to a video signal and it is inspected by comparing it with another video signal provided from data for designing the mask pattern. This inspection is made before the process of exposing the mask pattern on the fabricated object in order to avoid a waste of time in the semiconductor pattern process.
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Citations
24 Claims
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1. An inspection method for a mask pattern used in semiconductor fabrication which uses an optical system for exposing said mask pattern on a fabricated object and printing said mask pattern;
- thereon, the inspection method comprising the steps of;
projecting an optical image of said mask pattern onto an image sensor provided on a stage having said fabricated object mounted thereon; converting said optical image into a sensor video signal; generating a data video signal from design data used in fabricating said mask pattern, and comparing said sensor video signal to said data video signal for determining whether said mask pattern is normal. - View Dependent Claims (2)
- thereon, the inspection method comprising the steps of;
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3. An inspection apparatus for a mask pattern used in semiconductor fabrication, said apparatus comprising:
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an optical system for exposing said mask pattern on a fabricating object; an image sensor means for receiving an optical image of said mask pattern and for converting said optical image to a sensor video signal; data generating means for generating a data video signal from design data used in fabricating said mask pattern; and comparator means, coupled to said image sensor means and said data generating means, for comparing the output of said image sensor means to the output of said data generating means, said comparator means providing an indication of the difference therebetween; wherein said optical system comprises a single optical system for reducing and projecting said optical image of said mask pattern on a fabricated object and said image sensor. - View Dependent Claims (4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. An apparatus for inspection of a mask pattern and the fabrication of a semiconductor device, said apparatus comprising:
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an image sensor means for receiving an optical image of said mask pattern and for converting said optical image to a sensor video signal; data generating means for generating a data video signal from data design data used in fabricating said mask pattern; comparator means, coupled to said image sensor means and said data generating means, for comparing the output of said image sensor means to the output of said data generating means, said comparator means providing an indication of the difference therebetween, said difference being indicative of a defect in said mask pattern; and optical system means for first exposing said mask pattern on said image sensor means and then on an object to be fabricated whereby defects in said mask pattern are determined prior to the exposure of said mask pattern on the object to be fabricated. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
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Specification