Directional accelerometer and its microlithographic fabrication process

• US 4,653,326 A
• Filed: 12/27/1984
• Issued: 03/31/1987
• Est. Priority Date: 01/12/1984
• Status: Expired due to Term

• Current Assignee: Commissariat a L'Energie Atomique (AES Corporation)
• Original Assignee: Commissariat a L'Energie Atomique (AES Corporation)
• Inventors: Delapierre, Gilles, Danel, Jean-Sebastien, Michel, France
• Primary Examiner(s): Levy, Stewart J.
• Assistant Examiner(s): Oldham, Scott M.
• Application Number:
  US06/686,902
• Time in Patent Office: 824 Days
• Field of Search: 73/517 AV, 73/517 R, 73/517 B, 73/510
• US Class Current: 73/514.21
• CPC Class Codes: G01P 15/0802 Details
• CPC Class Codes: G01P 15/125 by capacitive pick-up
• CPC Class Codes: G01P 2015/0817 for pivoting movement of the mass, e.g. in-plane pendulum
• CPC Class Codes: G01P 2015/0828 the mass being of the paddle type being suspended at one of its longitudinal ends

Abstract

A directional accelerometer and a process for the microlithographic fabrication of such an accelerometer. The accelerometer includes a substrate having at least one recess to define at least one beam in the substrate. One of the ends of the beam is integrally formed with the remainder of the substrate. The beam, which is oriented in the first direction, is deformable into the recess in a second direction only, parallel to the substrate surface and perpendicular to the first direction. The second direction corresponds to the acceleration component to be measured. Electrical connections and contacts are formed in the substrate for the device measuring the deformations of the beam. These measurements make it possible to determine the acceleration components.

Claims

1. A monodirectional accelerometer for measuring one component of an acceleration of a moving body, comprising:

a substrate formed of a material and having at least one recess;

at least one parallelepipedic beam placed in the recess and having a first end which is integral with said substrate, said beam being formed of said material, being oriented in a first direction, having a width in a second direction and being able to deform in the second direction in said recess and having a thickness higher than its width, said thickness being oriented in a third direction perpendicular to said first and second directions so that said beam is only deformable in said second direction, said second direction being parallel to the surface of said substrate and perpendicular to said first direction, said deformation in said second direction corresponding to said component of said acceleration to be measured;

means for measuring deformations of said beam in said second direction to determine the value of said component of said acceleration; and

electrical contacts formed on said substrate for connecting said means for measuring with said beam.

2. An accelerometer according to claim 1, wherein the measuring means are formed in the substrate.

3. An accelerometer according to claim 1, wherein the other end of the beam supports a block, which is formed in the substrate and is able to move in the substrate recess in the second direction under the action of said acceleration component.

4. An accelerometer according to claim 3, wherein it comprises a spring, formed in the substrate and arranged in the extension of the block, connecting the latter to the substrate in the first direction.

5. An accelerometer according to claim 3, wherein the measuring means comprise at least one variable capacitance capacitor defined by a surface of the block and which is generally directed transversely to the second direction, a surface of the substrate facing said surface of the block, said surfaces being covered with a metal layer, and by the space located between said metallized surfaces.

6. An accelerometer according to claim 5, wherein the measuring means comprise at least one constant capacitance capacitor defined by another recess formed in the substrate, which has two facing surfaces, which are generally directed transversely to the second direction and which are covered by a metal layer.

7. An accelerometer according to claim 1, wherein the substrate is formed from silica deposited on silicon.

8. An accelerometer according to claim 1, wherein the substrate is made from monocrystalline α

quartz or silicon.

9. An accelerometer according to claim 5, wherein the measuring means comprise means making it possible to produce a magnetic field perpendicular to the surface of the substrate.

10. A process for the fabrication of a monodirectional accelerometer used for measuring one component of an acceleration of a moving body, said component being parallel to a first direction, said accelerometer comprising a substrate having at least one recess, at least one parallelepipedic beam placed in the recess and having a first end which is integral with said substrate, said beam oriented to a second direction parallel to a surface of said substrate and perpendicular to said first direction being able to deform only in said first direction and having a thickness higher than its width, said thickness being oriented to a third direction perpendicular to said first and second directions and said width being oriented to said first direction, measuring means for measuring deformations of said beam in said first direction and electrical contacts formed on said substrate for connecting said measuring means with said beam, said process comprising the following stages:

forming on said substrate a mask which defines the shape of said recess, said beam and in particular the width of said beam,

etching mask-free substrate regions in said third direction in order to form said recess and beam, the thickness of said beam being defined by said etching,

forming said measuring means,

eliminating said mask and

metallizing the etched substrate in order to produce said electrical connections and contacts.

11. A process according to claim 10, wherein the substrate is etched by a dry etching process.

12. A process according to claim 10, wherein the substrate is etched by means of a chemical etching process.

13. A process according to claim 10, wherein the mask is formed from a conductive material.

14. A process according to claim 13, wherein the mask is made from a double layer of chrome and gold.

15. A process according to claim 10, wherein the measuring means comprise capacitors and metallization takes place by vacuum deposition on the substrate surfaces which are used for defining said capacitors, following the mechanical masking of the substrate.

16. A process for the fabrication of a monodirectional accelerometer used for measuring one component of an acceleration of a moving body, said component being parallel to a first direction, said accelerometer comprising a substrate having at least one recess, at least one parallelepipedic beam placed in the recess and having a first end which is integral with said substrate, said beam oriented to a second direction parallel to a surface of said substrate and perpendicular to said first direction being able to deform only in said first direction and having a thickness higher than its width, said thickness being oriented to a third direction perpendicular to said first and second directions and said width being oriented to said first direction, measuring means for measuring deformations of said beam in said first direction and electrical contacts formed on said substrate for connecting said measuring means with said beam, said process comprising the following stages:

metallizing the substrate surface in order to produce said electrical connections and contacts,

forming on said metallized substrate a mask which defines the shape of said recess, said beam and in particular the width of said beam,

etching mask-free substrate regions in said third direction in order to form said recess and beam, the thickness of said beam being defined by said etching,

forming said measuring means and

eliminating said mask.

17. A process according to claim 16, wherein the substrate is etched by a dry etching process.

18. A process according to claim 16, wherein the substrate is etched by means of a chemical etching process.

19. A process for the fabrication of a monodirectional accelerometer used for measuring one component of an acceleration of a moving body, said component being parallel to a first direction, said accelerometer comprising a substrate having at least one recess, at least one parallelepipedic beam placed in the recess and having a first end which is integral with said substrate, said beam oriented to a second direction parallel to a surface of said substrate and perpendicular to said first direction being able to deform only in said first direction and having a thickness higher than its width, said thickness being oriented to a third direction perpendicular to said first and second directions and said width being oriented to said first direction, measuring means for measuring deformations of said beam in said first direction and electrical contacts formed on said substrate for connecting said measuring means with said beam, said process comprising the following stages:

forming on said substrate a conductive mask which defines the shape of said recess, said beam and in particular the width of said beam and which produces said electrical connections and contacts, said mask being shaped like a grid, of which bars have a limited spacing in the substrate regions which are to be free from said electrical connections,

etching mask-free substrate regions in said third direction in order to form said recess and beam, the thickness of said beam being defined by said etching, and

forming said measuring means.

20. A process according to claim 19, wherein the substrate is etched by a dry etching process.

21. A process according to claim 19, wherein the mask is formed from a conductive material.

22. A process according to claim 21, wherein the mask is made from a double layer of chrome and gold.

23. A process according to claim 19, wherein the substrate is etched by a dry etching process.

24. A process according to claim 19, wherein the substrate is etched by means of a chemical etching process.

25. A monodirectional accelerometer for measuring component of an acceleration of a moving body, comprising:

a substrate formed of a material and having at least one recess;

at least one parallelepipedic beam placed in the recess and having a first end which is integral with said substrate, said beam being formed of said material, being oriented in a first direction and being able to deform in a second direction in said recess and having a thickness higher than its width so that said beam is only deformable in said second direction, said second direction being parallel to the surface of said substrate and perpendicular to said first direction, said deformation in said second direction corresponding to said component of said acceleration to be measured;

said beam having a second end which supports a block, said block being formed in said substrate and being able to move in said recess in the second direction, said block being connected to the substrate in the first direction with a spring which is formed in the substrate;

means for measuring deformations of said beam in said second direction to determine the value of said component of said acceleration; and

electrical contacts formed on said substrate for connecting said means for measuring with said beam.