Method of making a micromechanical electric shunt
First Claim
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1. The method of making a micromechanical electric shunt on a substrate having a planar top surface, comprising the steps of:
- (a) preparing an insulating substrate by cleaning and drying the top surface thereof;
(b) depositing a first metallic covering layer on the top surface of said substrate;
(c) depositing a second metallic layer on the top surface of said first metallic layer;
(d) removing excess of said metallic layers from around two spaced apart areas of said metallic layers to produce a first metallic terminal and a second metallic terminal, by etching;
(e) depositing a removable third metallic layer over the top surface of said substrate, including said first terminal and said second terminal;
(f) etching a first hole through said third metallic layer to said first terminal and etching a second hole into said third metallic layer to form a surface within said third metallic layer and which is separated from said second terminal;
(g) providing an elongated cantilever beam plating surface resist pattern around and between said first and second holes on said third metallic layer;
(h) depositing a fourth metallic layer on said third metallic layer within said cantilever beam plating surface pattern to form a cantilever beam;
(i) removing said resist pattern;
(j) relieving said cantilever beam by removal of the entire third metallic layer; and
(k) cleaning the micromechanical electric shunt.
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Abstract
A micromechanical electric shunt is fabricated by micromachining according to recent IC fabrication procedures. A plurality of such shunts is incorporated on a single substrate to form novel process station or post identification or signature encoding apparatus for use on a telecommunications bus or the equivalent. Such identification of signature encoding apparatus may be configured for conventional binary coding. Both frequency and current derivative mode apparatus are disclosed.
95 Citations
13 Claims
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1. The method of making a micromechanical electric shunt on a substrate having a planar top surface, comprising the steps of:
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(a) preparing an insulating substrate by cleaning and drying the top surface thereof; (b) depositing a first metallic covering layer on the top surface of said substrate; (c) depositing a second metallic layer on the top surface of said first metallic layer; (d) removing excess of said metallic layers from around two spaced apart areas of said metallic layers to produce a first metallic terminal and a second metallic terminal, by etching; (e) depositing a removable third metallic layer over the top surface of said substrate, including said first terminal and said second terminal; (f) etching a first hole through said third metallic layer to said first terminal and etching a second hole into said third metallic layer to form a surface within said third metallic layer and which is separated from said second terminal; (g) providing an elongated cantilever beam plating surface resist pattern around and between said first and second holes on said third metallic layer; (h) depositing a fourth metallic layer on said third metallic layer within said cantilever beam plating surface pattern to form a cantilever beam; (i) removing said resist pattern; (j) relieving said cantilever beam by removal of the entire third metallic layer; and (k) cleaning the micromechanical electric shunt. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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Specification