Apparatus for forming deposited film
First Claim
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1. An apparatus for forming a deposited film comprising:
- a first compartment for forming a film on a substrate through thermal decomposition or polymerization of a starting gas, said first compartment having an evacuation means, a starting gas introducing means, a substrate holding means, and a heat applying means;
a second compartment for forming a film on a substrate through discharge decomposition or polymerization of a starting gas, said second compartment having an evacuation means, a starting gas introducing means, a substrate holding means, and a dischargae generating means; and
a means for delivering a substrate into and out of the first and second compartments.
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Abstract
An apparatus for forming a deposited film comprises a chamber, which can be brought into a reduced pressure, for forming a deposited film on a substrate by introducing a starting gas into said chamber and decomposing or polymerizing said gas, the apparatus is provided with both a means for decomposing or polymerizing said gas by discharging and a means for decomposing or polymerizing said gas by heat.
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2 Claims
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1. An apparatus for forming a deposited film comprising:
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a first compartment for forming a film on a substrate through thermal decomposition or polymerization of a starting gas, said first compartment having an evacuation means, a starting gas introducing means, a substrate holding means, and a heat applying means; a second compartment for forming a film on a substrate through discharge decomposition or polymerization of a starting gas, said second compartment having an evacuation means, a starting gas introducing means, a substrate holding means, and a dischargae generating means; and a means for delivering a substrate into and out of the first and second compartments. - View Dependent Claims (2)
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Specification