Trench etch endpoint detection by LIF

• US 4,675,072 A
• Filed: 06/25/1986
• Issued: 06/23/1987
• Est. Priority Date: 06/25/1986
• Status: Expired due to Fees

• Current Assignee: International Business Machines Corporation
• Original Assignee: International Business Machines Corporation
• Inventors: Ephrath, Linda M., Selwyn, Gary S., Schwartz, Geraldine C., Bennett, Reid S.
• Primary Examiner(s): Powell, William A.
• Application Number:
  US06/878,144
• Time in Patent Office: 363 Days
• Field of Search: 156/626, 156/627, 156/635, 156/643, 156/644, 156/646, 156/652, 156/653, 156/657, 156/656, 156/659.1, 156/661.1, 156/662, 156/663, 156/668, 156/345, 204/192 E, 204/298, 427/38, 427/39, 427/53.1, 118/50.1, 118/620, 118/728, 219/121 LH, 219/121 LJ, 219/121 LZ, 219/121 LM, 356/316, 356/381, 356/437
• US Class Current: 216/60
• CPC Class Codes: G01N 21/6402 Atomic fluorescence; Laser induced fluorescence
• CPC Class Codes: G01N 2201/1222 Endpoint determination; reaction time determination
• CPC Class Codes: H01J 37/32935 Monitoring and controlling tubes by information coming from the object and/or discharge
• CPC Class Codes: H01L 21/30621 Vapour phase etching
• CPC Class Codes: H01L 21/3065 Plasma etching; Reactive-ion etching
• CPC Class Codes: H01L 21/31116 by dry-etching
• CPC Class Codes: H01L 21/32136 using plasmas
• CPC Class Codes: H01L 21/32137 of silicon-containing layers

Abstract

Laser induced fluorescence is utilized to detect and control the reactive ion etch-through of a given layer in a wafer by detecting a large change in the concentration of a selected minor species from the wafer in the etching plasma. This selected minor species must be present in a significantly different concentration in the etched given layer compared to adjacent layers in the wafer in order to provide a proper endpoint detection. In one embodiment, when the large change in the selected minor species concentration is detected, then the RF electrodes for the reactor are automatically de-energized.

Claims

1. A reactive ion etching apparatus capable of automatically changing the etching when a given layer of one or more integrated circuit wafers is etched through to a second layer therebelow, wherein said given layer and said second layer have different concentrations of a minor species to be monitored, with the layer concentration thereof being less than or equal to 10% of the wafer layer by weight, comprising:

a plasma reactor housing containing a chamber and means for placing said wafer therein;

means for generating an etching ion plasma in said chamber suitable for etching said given layer through to said second layer and for causing said minor species to enter said plasma, wherein when said given layer is etched through to said second layer, the concentration of said minor species in said plasma changes;

means for directing a laser beam through said plasma in said chamber, with said laser beam having a first frequency suitable for pumping said minor species in its plasma to an excited energy state thereof, with said pumped minor species in said excited energy state then emitting a second frequency of radiation as said pumped minor species decays to a lower energy state;

means for detecting only said second frequency of radiation in said chamber and for generating a control signal when a change in a parameter of said second radiation frequency is detected; and

means for controlling said etching ion plasma generating means to change the plasma generation in accordance with said control signal from said detecting means.

2. An apparatus as defined in claim 1, wherein said plasma generating means includes at least one closable gas inlet into said chamber for providing a suitable gas for forming said ion plasma, and further includes an RF source for generating said plasma from said suitable gas;

and

wherein said controlling means controls at least said RF source in accordance with said control signal.

3. An apparatus as defined in claim 1, wherein said laser beam directing means comprises means for directing a pulsed laser beam through said ion plasma;

and

wherein said detecting means includes means for detecting said second radiation frequency only for a predetermined time period after initiation of each of said laser beam pulses.

4. An apparatus as defined in claim 3, wherein said detecting means includes means for generating a control signal when the intensity parameter of said second frequency of radiation changes by a predetermined amount.

5. An apparatus as defined in claim 4, wherein said given layer of said wafer is an Al film with Cu as said minor species, and said second layer does not contain Cu as a minor species.

6. An apparatus as defined in claim 5, wherein said plasma generating means includes means for generating a plasma containing Cl;

and

wherein said laser beam directing means includes means for directing said laser beam with a first frequency which is suitable for pumping a Cu minor species of [CuCl]_x to an upper energy state.

7. An apparatus as defined in claim 6, wherein said detecting means includes means for generating said control signal when the intensity parameter of said second frequency of radiation decreases to less than 5% of its initial value in etching said given layer.

8. An apparatus as defined in claim 7, wherein said plasma generating means includes at least one closable gas inlet into said chamber for providing a suitable gas for forming said ion plasma, and, further includes an RF source for generating said plasma from said suitable gas;

and

wherein said controlling means controls at least said RF source in accordance with said control signal.

9. An apparatus as defined in claim 4, wherein said given layer of said wafer is SiO₂ without Al doping, and said second layer includes a plurality of Al alloy studs therein, with Al comprising said minor species to be monitored.

10. An apparatus as defined in claim 9, wherein said plasma generating means includes means for generating a plasma containing F;

and

wherein said laser beam directing means includes means for directing said laser beam with a first frequency which is suitable for pumping an Al minor species of AlF to an upper energy state.

11. An apparatus as defined in claim 10, wherein said detecting means includes means for generating said control signal when the intensity parameter of said second frequency of radiation increases to a constant value.

12. An apparatus as defined in claim 11, wherein said plasma generating means includes at least one closable gas inlet into said chamber for providing a suitable gas for forming said ion plasma, and further includes an RF source for generating said plasma from said suitable gas;

and

wherein said controlling means controls at least said RF source in accordance with said control signal.

13. An apparatus as defined in claim 4, wherein said given layer is chosen from the group consisting of Si with As as said minor species, Si with P as said minor species, Si with B as said minor species, GaAs with Zn (p type) as said minor species, GaAs with S (n type) as said minor species, and GaAs with Si (n type) as said minor species.

14. An apparatus as defined in claim 4, wherein said given layer is Si with As as said minor species;

and

wherein said plasma generating means includes means for generating a plasma which causes said As minor species to form a species in the plasma from the group consisting of AsCl, and AsF, and As.

15. An apparatus as defined in claim 4, wherein said detecting means includes means for generating said control signal when the intensity parameter of said second frequency of radiation decreases by at least 50%.

16. An apparatus as defined in claim 15 wherein said plasma generating means includes at least one closable gas inlet into said chamber for providing a suitable gas for forming said ion plasma, and further includes an RF source for generating said plasma from said suitable gas;

and

wherein said controlling means controls at least said RF source in accordance with said control signal.

17. An apparatus as defined in claim 4, wherein said given layer is polycrystalline silicon heavily doped with a minor species B, and said second layer therebelow contains a B minor species therein of a concentration that is at least 50% less than in said given layer.

18. An apparatus as defined in claim 17, wherein said detecting means includes means for generating said control signal when the intensity parameter of said second frequency of radiation decreases by at least 50%.

19. An apparatus as defined in claim 18 wherein said plasma generating means includes at least one closable gas inlet into said chamber for providing a suitable gas for forming said plasma, and an RF source for generating said plasma from said suitable gas;

and

wherein said controlling means controls at least said RF source in accordance with said control signal.

20. An apparatus as defined in claim 4, wherein said laser beam directing means includes means for moving said laser beam to scan a predetermined volume of said plasma in said chamber.

21. An apparatus as defined in claim 4, wherein said laser beam directing means includes means for focusing said laser beam to a predetermined point in said plasma and for scanning that focused point over a plurality of predetermined volumes in said chamber;

and

wherein said detecting means includes means for detecting said second frequency of radiation emitted from said scanned point in said plasma.

22. An apparatus as defined in claim 21, wherein said plasma generating chamber includes at least two closable gas inlets into said chamber, each for providing a suitable gas into a different one of said plurality of predetermined volumes of said chamber for forming said plasma therein;

wherein said detecting means includes means for comparing the intensity of said second frequency of radiation obtained for each of said focused points in a given one of said plurality of predetermined volumes in said plasma to a reference value and generating a signal indicative of this comparison as said control signal; and

wherein said controlling means includes means for regulating the amount of gas provided to said given one of said plurality of predetermined volumes by its respective gas inlet in accordance with said control signal.

23. A method for automatically controlling the etching of an integrated circuit wafer in the chamber of a reactive ion etching reactor when a given layer of radiation as said pumped minor species decays to a said wafer is etched through to a second layer therebelow, wherein said given layer and said second layer have different concentrations of a minor species, with the larger concentration thereof being less than or equal to 10% of either of the wafer layers by weight, comprising the steps of:

etching said wafer in said etching reactor with an etching ion plasma suitable for etching said given layer through to said second layer and for causing said minor species to enter said plasma, wherein when said given layer is etched through to said second layer, the concentration or said minor species changes;

directing a laser beam through said plasma in said chamber, with said laser beam having a first frequency suitable for pumping said minor species in said plasma to an excited energy state thereof, with said pumped minor species in said excited energy state then emitting a second frequency of radiation as said pumped minor species decays to a lower energy state;

detecting said second frequency of radiation in said chamber;

generating a control signal when a change in a parameter of said second frequency of radiation is detected, thereby indicating that said given layer has been etched through to said second layer; and

changing the plasma generation in said chamber in accordance with said control signal.

24. A method as defined in claim 23, wherein said etching step comprises the step of generating said suitable plasma by applying RF energy into a suitable gas in said etching reactor;

and

25. A method as defined in claim 23, wherein said laser beam directing step comprises pulsing said laser beam through said plasma;

and

wherein said detecting step comprises detecting for said second frequency of radiation only for a predetermined time period after initiation of each laser beam pulse.

26. A method as defined in claim 25, wherein said etching step comprises the step of etching a wafer with a given layer of Al film with a Cu minor species, and with a second layer which does not contain Cu.

27. A method as defined in claim 26, wherein said etching step includes the step of etching with a plasma containing Cl;

and

wherein said laser beam directing step includes the step of directing said laser beam with a first frequency which is suitable for pumping a Cu minor species of [CuFl]_x to an upper energy state.

28. A method as defined in claim 27, wherein said control signal generating step includes the step of generating said control signal when the intensity parameter of said second frequency of radiation decreases to less than 5% of its initial value.

29. A method as defined in claim 28, wherein said etching step comprises the step of generating said suitable plasma by applying RF energy into a suitable gas in said etching reactor;

and

wherein said plasma generation changing step comprises stopping the application of said RF energy to said suitable gas in said etching reactor in accordance with said control signal.

30. A method as defined in claim 25, wherein said etching step comprises the step of etching a given layer of SiO₂ without Al doping and with a second layer thereunder including a plurality of Al studs therein which contact the bottom surface of said SiO₂ layer, with Al comprising said minor species to be monitored.

31. A method as defined in claim 30, wherein said etching step comprises the step of etching with a plasma containing F;

and

wherein said laser beam directing step comprises the step of directing said laser beam with a first frequency which is suitable for pumping a minor species of AlF to an upper energy state.

32. A method as defined in claim 31, wherein said control signal generating step comprises the step of generating said control signal when the intensity parameter of said second frequency of radiation increases to a constant value.

33. A method as defined in claim 32, wherein said etching step comprises the step of generating said suitable plasma by applying RF energy into a suitable gas in said etching reactor;

and

wherein said plasma generation changing step comprises stopping the application of said RF energy to said suitable gas in said etching reactor in accordance with said control signal.

34. A method as defined in claim 25, wherein said etching step comprises the step of etching a given layer chosen from the group consisting of Si with As as said minor species, Si with P as said minor species, Si with B as said minor species, GaAs with Zn (p type) as said minor species, GaAs with S (n type) as said minor species, and GaAs with Si (n type) as said minor species.

35. A method as defined in claim 25, wherein said etching step comprises the step of:

etching a given layer of Si with As as said minor species by generating a plasma which causes said As minor species to form a species in the plasma from the group consisting of AsCl, AsF, and As.

36. A method as defined in claim 35, wherein said control signal generating step comprises the step of generating said control signal when the intensity parameter of said second frequency of radiation decreases by at least 50%.

37. A method as defined in claim 36, wherein said etching step comprises the step of generating said suitable plasma by applying RF energy into a suitable gas in said etching reactor;

and

wherein said plasma generation changing step comprises stopping the application of said RF energy to said suitable gas in said etching reactor in accordance with said control signal.

38. A method as defined in claim 25, wherein said etching step comprises the step of etching a given layer of polycrystalline silicon heavily doped with a minor species B and with said second layer thereunder containing a B minor species therein with a concentration that is at least 50% less than that in said given layer.

39. A method as defined in claim 38, wherein said control signal generating step comprises the step of generating said control signal when the intensity parameter of said second frequency of radiation decreases by at least 50%.

40. A method as defined in claim 39, wherein said etching step comprises the step of generating said suitable plasma by applying RF energy into a suitable gas in said etching reactor;

and

wherein said plasma generation changing step comprises stopping the application of said RF energy to said suitable gas in said etching reactor in accordance with said control signal.

41. A method as defined in claim 25, wherein said laser beam directing step includes the step of moving said laser beam to scan a predetermined volume of said plasma in said chamber.

42. A method as defined in claim 25, wherein said laser beam directing step includes the step of focusing said laser beam to a predetermined point in said plasma and scanning that focused point over a plurality of predetermined volumes in said chamber;

and

wherein said detecting step includes the step of detecting said second frequency of radiation emitted from said scanned point in said plasma.

43. A method as defined in claim 42, wherein said etching step includes the step of directing a suitable gas for generating said plasma into said etching reactor by means of at least two closable gas inlets thereinto, with each gas inlet providing said suitable gas into a different one of said plurality of predetermined volumes in said chamber for forming said plasma therein;

wherein said detecting step includes the step of comparing the intensity of said detected second frequency of radiation of said focused points in a given one of said plurality of predetermined volumes in said plasma to a reference value;

wherein said control signal generating step includes the step of generating a signal indicative of the comparison as said control signal; and

wherein said plasma generation changing step includes the step of regulating the amount of gas provided to said given one of said plurality of predetermined volumes by its respective gas inlet in accordance with said control signal.