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Alignment apparatus

  • US 4,677,301 A
  • Filed: 12/14/1984
  • Issued: 06/30/1987
  • Est. Priority Date: 12/19/1983
  • Status: Expired due to Term
First Claim
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1. In an apparatus for projecting an image of a pattern onto a substrate by a projection optical system, an apparatus for detecting a two-dimensional positional error between the image of the pattern and the substrate, comprising:

  • first detecting means for detecting a positional error along an x-axis of an x-y orthogonal coordinate system arranged on an image surface of said projection optical system and having an origin on an optical axis of said projection optical system, said first detecting means including optical means for allowing observation of the image surface through said projection optical system; and

    second detecting means for detecting a positional error along a y-axis of the x-y coordinate system and a positional error along a rotating direction about the origin, said second detecting means including optical means for allowing observation of the image surface and arranged separately from said projection optical system.

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