Optical absorption spectroscopy for semiconductors

• US 4,678,989 A
• Filed: 03/19/1985
• Issued: 07/07/1987
• Est. Priority Date: 03/23/1984
• Status: Expired due to Fees

• Current Assignee: US Philips Corporation (Koninklijke Philips N.V.)
• Original Assignee: US Philips Corporation (Koninklijke Philips N.V.)
• Inventors: Blood, Peter
• Primary Examiner(s): Eisenzopf, Reinhard J.
• Assistant Examiner(s): Nguyen, Vinh P.
• Application Number:
  US06/713,525
• Time in Patent Office: 840 Days
• Field of Search: 324/158 D, 324/158 R, 324/158 T, 324/71.5, 250/492.2, 357/30, 357/456
• US Class Current: 324/762.01
• CPC Class Codes: G01R 31/2656 using non-ionising electromagnetic radiation, e.g. optical radiation

Abstract

Optical absorption data for a semiconductor sample is derived by providing a p-type layer (4) of the semiconductor sample between two larger band gap p-type cladding layers (3,5) on an n-type substrate (1). A p-type buffer layer (2) may be present on the substrate (1). Optical radiation is directed towards the p-n junction (6) between the substrate (1) and the buffer layer (2) through a transparent electrode (8) on the outer cladding layer (5). A further electrode (7) contacts the substrate (1) whereby an electric signal can be derived which is related to the voltage generated by the photovoltaic effect at the p-n junction. This signal is indicative of the absorption in the semiconductor sample (4) of the incident radiation in the wavelength range above the absorption edges of both cladding layers and below the wavelength limit at which the p-n junction is sensitive.

Claims

1. A method for spectroscopically analyzing optical absorption in a semiconductor sample comprising the steps of

forming a first cladding layer, a semiconductor sample layer, and a second outer cladding layer on a substrate, said first and second cladding layers having a larger band gap than said sample layer, wherein said sample layer and said first and second cladding layers are all of one conductivity type, and said substrate is of an opposite conductivity type, and wherein a p-n junction between said substrate and said first cladding layer is sensitive to optical radiation at a wavelength above absorption edges of said first and second cladding layers,

forming a first electrode structure on said substrate,

forming a second electrode structure on said second cladding layer, said second electrode structure being transparent to said optical radiation,

directing said optical radiation toward said sample layer through said second cladding layer, and

deriving a signal from said first and second electrode structures, said signal being related to a voltage generated across said p-n junction by a photovoltaic effect, and said signal being indicative of optical absorption in said sample layer of incident optical radiation in a wavelength range above said absorption edges of said first and second cladding layers and below a wavelength limit where said p-n junction is sensitive,

wherein said second outer cladding layer has a sufficient thickness to prevent a depletion layer from extending into said semiconductor sample layer, said depletion layer being associated with a junction of said second cladding layer and said second electrode structure, and wherein said first cladding layer is sufficiently thick to substantially confine charge carriers generated by absorption of said optical radiation in said semiconductor sample layer.

2. A method according to claim 1, wherein a semiconductor buffer layer is formed between said first cladding layer and said substrate.

3. A method according to claim 2, wherein said buffer layer is of the same conductivity type as said semiconductor sample layer and said first and second cladding layers, said p-n junction being located between said buffer layer and said substrate.

4. A method according to claim 1, claim 2, or claim 3 wherein said first and second cladding layers are the same semiconductor material.

5. A method according to claim 1, claim 2, or claim 3, wherein said second electrode structure includes an electrolyte.

6. A method according to claim 1, claim 2, or claim 3, wherein said semiconductor sample layer includes a plurality of sub-layers of different semiconductor material.

7. A method according to claim 1, claim 2, or claim 3, further comprising the steps of varying wavelength of said optical radiation, and recording said signal as a function of said wavelength.

8. A method according to claim 1, claim 2, or claim 3, further comprising the steps of varying intensity of said optical radiation incident on said semiconductor sample layer, measuring said intensity, and recording a signal related to said intensity.

9. A method according to claim 8, wherein said step of varying intensity is carried out by a variable attentuator.

10. A method according to claim 1, claim 2, or claim 3 further comprising the step of varying intensity of said optical radiation incident on said semiconductor sample layer in response to said signal related to said voltage generated across said p-n junction by said photovoltaic effect.

11. A method according to claim 10, wherein said step of varying intensity is carried out by a variable attenuator.

12. A method according to claim 1, claim 2, or claim 3, further comprising the step of continuously varying wavelengths of emitted optical radiation.

13. An apparatus for spectroscopically analyzing optical absorption in a semiconductor sample comprising

a substrate, a first cladding layer on said substrate, a semiconductor sample layer on said first cladding layer, and a second cladding layer on said sample layer, said first and second cladding layers having a larger band gap than said sample layer, wherein said sample layer and said first and second cladding layers are all of one conductivity type, and said substrate is of an opposite conductivity type, and wherein a p-n junction between said substrate and said first cladding layer is sensitive to optical radiation of a wavelength above absorption edges of said first and second cladding layers,

first electrode means for contacting said substrate,

second electrode means transparent to optical radiation for contacting said second cladding layer,

radiation means for directing monochromatic optical radiation to said sample layer through said transparent second electrode means, and

first means for deriving a signal from said first and second electrode means, said signal being related to a voltage generated across said p-n junction by a photovoltaic effect, and said signal indicating absorption in said semiconductor sample layer of said optical radiation.

14. An apparatus according to claim 13 wherein said second cladding layer has a sufficient thickness to prevent a depletion layer, associated with a junction of said second cladding layer and said second electrode means, from extending into said semiconductor sample layer, and wherein said first cladding layer is of sufficient thickness to substantially confine charge carriers in said semiconductor sample layer.

15. An apparatus according to claim 13, wherein a semiconductor buffer layer is formed between said first cladding layer and said substrate.

16. An apparatus according to claim 15, wherein said buffer layer is of said one conductivity type, said p-n junction being disposed between said buffer layer and said substrate.

17. An apparatus according to claim 13, claim 14, claim 15, or claim 16, wherein said first and second cladding layers are the same semiconductor material.

18. An apparatus according to claim 13, claim 14, claim 15, or claim 16, wherein said second electrode means includes an electrolytic cell.

19. An apparatus according to claim 13, claim 14, claim 15, or claim 16, wherein said semiconductor sample layer includes a plurality of sublayers of different semiconductor materials.

20. An apparatus according to claim 13, claim 14, claim 15, or claim 16, wherein second means are included for varying intensity of said optical radiation incident on said semiconductor sample layer in response to said signal related to a voltage across said p-n junction.

21. An apparatus according to claim 20, wherein said second means includes a variable attenuator.

22. An apparatus according to claim 21, wherein third means are included for recording said signal as a function of wavelength of said optical radiation.

23. An apparatus according to claim 20, wherein fourth means are included for measuring said intensity incident on said sample layer, and fifth means are included for providing a second signal related to said intensity.

24. An apparatus according to claim 13, claim 14, claim 15, or claim 16, wherein second means are included for continuously vaying wavelengths of emitted optical radiation.

25. An apparatus according to claim 24, wherein recording means are provided for recording said signal from said first means as a function of wavelengths of said optical radiation directed by said radiation means.

26. An apparatus according to claim 25, wherein said recording means includes a graph plotter.