Method of manufacturing ion selective electrode pair

• US 4,683,048 A
• Filed: 05/16/1985
• Issued: 07/28/1987
• Est. Priority Date: 05/18/1984
• Status: Expired due to Term

• Current Assignee: Fuji Photo Film Co Limited (Fujifilm Holdings Corporation)
• Original Assignee: Fuji Photo Film Co Limited (Fujifilm Holdings Corporation)
• Inventors: Takayama, Takeshi, Yamada, Sadao, Yamaguchi, Akira, Seshimoto, Osamu
• Primary Examiner(s): Tung, T.
• Application Number:
  US06/734,974
• Time in Patent Office: 803 Days
• Field of Search: 204/416-420, 83/875, 422/55, 422/100
• US Class Current: 204/416
• CPC Class Codes: G01N 27/307 Disposable laminated or multilayered electrodes G01N27/3272 takes precedence
• CPC Class Codes: G01N 27/3335 the membrane containing at least one organic component G01N27/3271 takes precedence; aspects concerning the enzyme reagent in enzyme electrodes C12Q1/001
• CPC Class Codes: Y10T 83/0304 Grooving

Abstract

A conductive layer is formed on an insulating base, and at least one groove is formed in the conductive layer by cutting a part of the material of the conductive layer so that the conductive layer is divided into at least a pair of portions electrically isolated from each other by the cut groove. Thereafter, an ion selective layer is formed on the conductive layer to cover substantially the entire surface of the conductive layer including the cut groove.

Claims

1. A method of manufacturing an ion selective electrode pair comprising the steps of:

forming a conductive layer on an insulating base;

dividing said conductive layer into at least two portions electrically isolated from each other by simultaneously cutting and removing at least a part of the material of the conductive layer with a cutting tool selected from the group consisting of a slotter tool bit, a fluting tool bit and a cutting-off cutter to form a groove; and

then

forming an ion selective layer on said conductive layer.

2. A method as defined in claim 1 in which said conductive layer is selected from the group consisting of conductive metals, conductive metal oxides and graphite.

3. A method as defined in claim 1 in which said conductive layer comprises graphite and a redox couple containing at least two kinds of redox couple salts.

4. A method as defined in claim 1 in which said conductibe layer comprises silver and said layer of water-insoluble salt comprises silver halide.

5. A method as defined in claim 1 in which at least one of said two portions of the conductive layer has an area exhibiting a certain potential when a sample liquid is brought into contact with the ion selective layer.

6. The method of claim 1 wherein the conductive layer is formed from a conductive metal and which further comprises forming a layer of a water-insoluble salt of the metal of the conductive layer on the conductive layer prior to cutting the groove.

7. The method of claim 1 further comprising forming a redox couple layer containing at least two kinds of redox couple salts on the conductive layer prior to cutting the groove.

8. the method of claim 1 wherein the conductive layer comprises a conductive metal and which further comprises, prior to cutting said groove, forming a layer of a water-insoluble salt of the conductive metal on the conductive layer and then forming a layer of a water-soluble salt having an anion in common with the water-insoluble salt on the layer of the water-insoluble salt.

9. The method of claim 1 wherein the conductive layer comprises silver, and which further comprises, after cutting the groove, forming a silver halide layer by oxidative halogenation of the silver layer and then forming the ion selective layer.