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Apparatus for producing semiconductor devices

  • US 4,693,777 A
  • Filed: 11/27/1985
  • Issued: 09/15/1987
  • Est. Priority Date: 11/30/1984
  • Status: Expired due to Term
First Claim
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1. An apparatus for producing semiconductor devices comprising:

  • a dry etching unit for dry etching a material to be treated, said dry etching unit having an etching chamber in which said material to be treated is etched, an electrode for applying RF power to said material to be treated which is securely held in position, a gas introduction means for introducing etching gases into said etching chamber, a loading chamber communicating with said etching chamber for transferring the material to be treated into said etching chamber, and an unloading chamber communicating with said etching chamber for transferring the material to be treated from said etching chamber into said unloading chamber;

    a heat-treatment unit for heat treating said material dry-etched, said heat-treatment unit having a transfer chamber communicating with said unloading chamber of said dry etching unit for transferring the material to be treated from said unloading chamber, a heat-treatment chamber communicating with said transfer chamber, and heating means disposed in said heat-treatment chamber for heating the material to be treated; and

    a water cleaning unit with a chuck for cleaning said material heat-treated with water while said chuck holds in position and rotates said material.

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