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Process of transfer of mask pattern onto substrate and apparatus for alignment therebetween

  • US 4,699,515 A
  • Filed: 02/26/1985
  • Issued: 10/13/1987
  • Est. Priority Date: 02/28/1984
  • Status: Expired due to Term
First Claim
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1. An apparatus for successively aligning a first pattern formed on a photomask with a plurality of identical second patterns formed, according to a prescribed arrangement, on a substrate, comprising:

  • stage means adapted for supporting said substrate and movable two-dimensionally along the face of said substrate;

    means for detecting relative rotational error between said first pattern and at least one of said plurality of second patterns;

    means for causing relative rotation between said photomask and said substrate in order to compensate the relative rotational error detected by said detecting means and to correct the rotational aberrations of each of said second patterns; and

    means for controlling the movement of said stage means according to said prescribed arrangement so as to align said first pattern with each of said second patterns successively.

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