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Optical arrangement for photometrical analysis measuring devices

  • US 4,707,131 A
  • Filed: 10/15/1985
  • Issued: 11/17/1987
  • Est. Priority Date: 11/01/1984
  • Status: Expired due to Fees
First Claim
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1. An optical arrangement in a photometrical measuring device for analyzing a sample material, comprisinga light emitting system for emitting a bundle of monochromatic radiation to propagate along an optical axis, said light emitting system having a field aperture for said monochromatic radiation,a lens,a sample mount for mounting a material to be analyzed,an optical imaging system,a detector means,said lens, said sample mount, said optical imaging system and said detector means being sequentially arranged in that order along said optical axis in mutual optical alignment,said optical imaging system having an aperture greater than that of the field aperture,said monochromatic radiation being focused onto a sample on said sample mount for producing a sample material radiation,said sample material radiation being composed of a first radiation portion containing measuring information of said sample material, and of a second radiation portion not containing measuring information,said first radiation portion being imaged through said optical imaging system onto said detector means for evaluation, andan optical member arranged adjacent to said optical imaging system along said optical axis, said optical member being removable from said optical arrangement in a direction at right angles to said optical axis, said optical member covering a portion of said optical imaging system.

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