Election beam exposure system and an apparatus for carrying out a pattern unwinder
DCFirst Claim
1. A method of exposing a predetermined pattern at a target plane to an electron beam that is momentarily flashed on at each of plural exposure locations within the predetermined pattern until the predetermined pattern is entirely exposed, said method comprising the steps of:
- (a) storing pattern data representing said predetermined pattern, said pattern data specifying the location, size and shape of the predetermined pattern on the target plane;
(b) in response to the pattern data for said predetermined pattern, determining the beam spot sizes, shaped and exposure locations on the target plane required to expose the predetermined pattern;
(c) sequentially deflecting the electron beam to each of said exposure locations in turn; and
(d) at each exposure location attained in step (c), momentarily exposing the beam on said target surface and shaping the beam top expose only the beam spot shape determined in step (b) for that exposure location.
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Accused Products
Abstract
In an electron beam system in which the beam is exposed in selected prescribed patterns on a target surface, stored pattern data specifies the location of the pattern as coordinates on the target plane of a reference point in the pattern, specifies the shape of the pattern as a code identifying one of several permissible shapes, and specifies the size of the pattern as dimensions of first and second pattern dimensions in the target plane. In exposing each pattern, the data is: modified to provide the selected pattern in the desired size; modified to determine the maximum beam size for the selected pattern; dynamically fragmented into individual beam flashes; and examined to determine the beam spot size, shape and position for each flash. All patterns are generally designated as trapezoids, with a triangle considered as a trapezoid having one side of zero length, a rectangle considered as a trapezoid having four right angles, etc.
32 Citations
15 Claims
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1. A method of exposing a predetermined pattern at a target plane to an electron beam that is momentarily flashed on at each of plural exposure locations within the predetermined pattern until the predetermined pattern is entirely exposed, said method comprising the steps of:
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(a) storing pattern data representing said predetermined pattern, said pattern data specifying the location, size and shape of the predetermined pattern on the target plane; (b) in response to the pattern data for said predetermined pattern, determining the beam spot sizes, shaped and exposure locations on the target plane required to expose the predetermined pattern; (c) sequentially deflecting the electron beam to each of said exposure locations in turn; and (d) at each exposure location attained in step (c), momentarily exposing the beam on said target surface and shaping the beam top expose only the beam spot shape determined in step (b) for that exposure location. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. Apparatus for exposing a predetermined pattern in a target plane to an electron beams, said apparatus comprising:
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selectively actuable flash generator means for momentarily emitting an electron beam generally toward said target plane; storage means for storing pattern data representing the size, shape and location of said predetermined pattern on the target plane; control means responsive to the stored pattern data for establishing beam spot sizes, shapes and exposure locations on the target plane required to expose the predetermined pattern; deflection means for sequentially deflecting said beam to each of said exposure locations in turn; actuator means for actuating said flash generator means momentarily at each of said exposure locations; and shaping means for shaping the beam at each of said exposure locations in accordance with the beam spot shape established for that exposure location by said control means. - View Dependent Claims (12, 13, 14, 15)
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Specification