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Process and apparatus for plasma treatment

  • US 4,718,976 A
  • Filed: 08/19/1986
  • Issued: 01/12/1988
  • Est. Priority Date: 03/31/1982
  • Status: Expired due to Term
First Claim
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1. A process for plasma treatment of a material in a treating chamber using a separate plasma generating chamber, comprising the steps of:

  • (a) introducing an activated gas, excited in the plasma generating chamber, into the treating chamber through an activated gas opening, so that the activated gas impinges upon a gas diffusing device positioned in front of the activated gas opening perpendicular to the direction of the activated gas flow and parallel to the material in the treating chamber;

    (b) distributing the activated gas within the treating chamber using the gas diffusing device after the activated gas has impinged upon the gas diffusing device, said distributing step comprising distributing the activated gas in a limited treating region defined by a barrier positioned within the treating chamber and extending from an upper portion at either side of the plasma generating chamber adjacent the activated gas opening to a lower portion at either side of the material to be treated; and

    (c) bringing the activated gas into contact with the surface of the material to be treated downstream of the gas diffusing device within the treating chamber.

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