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Methods of using photosensitive compositions containing microgels

  • US 4,726,877 A
  • Filed: 12/18/1986
  • Issued: 02/23/1988
  • Est. Priority Date: 01/22/1986
  • Status: Expired due to Fees
First Claim
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1. In a process for laminating a photosensitive film to a substrate comprising the steps of(a) laminating to the substrate a supported solid photosensitive film,(b) imagewise exposing the layer to actinic radiation,(c) removing unexposed areas of the layer to form resist areas,(d) permanently modifying areas of the substrate which are unprotected by the resist areas by etching the substrate or by depositing a material onto the substrate, andwherein the improvement comprises the photosensitive film which contains(a) addition polymerizable ethylenically unsaturated monomer,(b) initiating system activated by actinic radiation,(c) preformed macromolecular polymer binder, and(d) microgel,wherein the photosensitive composition is a solid and wherein at least one of the following is present:

  • (i) the polymer binder and microgel form substantially one phase as viewed by the naked eye, or(ii) the polymer binder and microgel have glass transition temperatures which do not differ by more than 50°

    C. with the microgel having a glass transition temperature above 25°

    C.

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