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Self-assembled nanometer lithographic masks and templates and method for parallel fabrication of nanometer scale multi-device structures

  • US 4,728,591 A
  • Filed: 03/07/1986
  • Issued: 03/01/1988
  • Est. Priority Date: 03/07/1986
  • Status: Expired due to Fees
First Claim
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1. A nanosubstrate for the production of patterns on a nanometer scale comprising:

  • a substrate base;

    a self-assembled two-dimensional array overlying said substrate base, said two-dimensional array forming a two-dimensional spatial pattern of at least one of thickness, density and chemical reactivity variation, said pattern having a characteristic dimension of 1-50 nanometers;

    a patterned layer formed on said array and having a pattern which is determined by said spatial pattern of said array; and

    at least one electrode coupled to at least one of said patterned layer and said array.

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