Self-assembled nanometer lithographic masks and templates and method for parallel fabrication of nanometer scale multi-device structures
First Claim
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1. A nanosubstrate for the production of patterns on a nanometer scale comprising:
- a substrate base;
a self-assembled two-dimensional array overlying said substrate base, said two-dimensional array forming a two-dimensional spatial pattern of at least one of thickness, density and chemical reactivity variation, said pattern having a characteristic dimension of 1-50 nanometers;
a patterned layer formed on said array and having a pattern which is determined by said spatial pattern of said array; and
at least one electrode coupled to at least one of said patterned layer and said array.
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Abstract
Articles exhibiting fabricated structures with nanometer size scale features (nanostructures), typically a device comprising nanostructures of a functional material on or in a substrate of dissimilar material, are produced by a method employing a substrate base or coating and a thin layer serving as a lithographic mask or template, consisting of a self-assembled ordered material array, typically a periodic array of molecules such as undenatured proteins, exhibiting holes, thickness or density variations. It is possible to produce complex structures containing large numbers of nanometers scale elements through a small number of simple steps.
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Citations
38 Claims
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1. A nanosubstrate for the production of patterns on a nanometer scale comprising:
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a substrate base; a self-assembled two-dimensional array overlying said substrate base, said two-dimensional array forming a two-dimensional spatial pattern of at least one of thickness, density and chemical reactivity variation, said pattern having a characteristic dimension of 1-50 nanometers; a patterned layer formed on said array and having a pattern which is determined by said spatial pattern of said array; and at least one electrode coupled to at least one of said patterned layer and said array. - View Dependent Claims (8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 26)
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2. A nanosubstrate for the production of patterns and structures on a nanometer scale comprising:
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a substrate base; a plurality of projections disposed in a pattern on said base, said pattern having a characteristic dimension of 1-50 nanometers and corresponding to a two-dimensional spatial pattern of at least one of thickness, density and chemical reactivity variations in a self-assembled two-dimensional array; and a layer of material disposed on said base and between said projections, said material of said layer being different than material of said projections, said material not forming said pattern naturally. - View Dependent Claims (25, 27, 28, 29, 30, 31, 32, 33)
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3. A nanosubstrate for the production of patterns on a nanometer scale comprising:
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a substrate base; a self-assembled two-dimensional array overlying said substrate base, said two-dimensional array forming a two-dimensional spatial pattern of at least one of thickness, density and chemical reactivity variations, said pattern having a characteristic dimension of 1-50 nanometers; and means for determining the state of selected portions of said array. - View Dependent Claims (4)
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5. A microsubstrate for the production of patterns on a nanometer scale comprising:
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a substrate base; and a self-assembled two-dimensional array overlying said substrate base, said two-dimensional array forming a two-dimensional spatial pattern of one of thickness variations, density variations and holes, said pattern having a characteristic dimension of 1-50 nanometers, said substrate base having depressions therein corresponding to said holes. - View Dependent Claims (34, 35, 36, 37, 38)
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6. A nanosubstrate for the production of patterns on a nanometer scale comprising:
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a substrate base; a self-assembled two-dimensional array overlying said substrate base, said two-dimensional array forming a two-dimensional spatial pattern of holes, said pattern having a characteristic dimension of 1-50 nanometers; and a patterned layer disposed on said array, and substantially not on said substrate base and having a pattern of holes which is determined by said spatial pattern of said array.
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7. A nanosubstrate for the production of patterns on a nanometer scale comprising:
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a substrate base; a self-assembled two-dimensional array overlying said substrate base, said two-dimensional array forming a two-dimensional spatial pattern of at least one of thickness, density and chemical reactivity variations, said pattern having a characteristic dimension of 1-50 nanometers; and a patterned layer disposed on said array, and having a pattern of holes which is determined by said spatial pattern of said array.
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Specification