Touch selection pad and method of manufacture

• US 4,731,694 A
• Filed: 04/20/1987
• Issued: 03/15/1988
• Est. Priority Date: 05/05/1986
• Status: Expired due to Fees

• Current Assignee: Siemens AG
• Original Assignee: Siemens AG
• Inventors: Grabner, Gunther, Stephani, Dietrich
• Primary Examiner(s): GRIFFIN, DONALD
• Application Number:
  US07/040,239
• Time in Patent Office: 330 Days
• Field of Search: 361/320, 361/321, 361/280, 200/DIG. 1, 29/25.42, 307/116, 340/365 C, 338/22
• US Class Current: 361/280
• CPC Class Codes: G06F 3/041 Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
• CPC Class Codes: G06F 3/04146 using pressure sensitive conductive elements delivering a boolean signal and located between crossing sensing lines, e.g. located between X and Y sensing line layers
• CPC Class Codes: H01H 13/702 with contacts carried by or formed from layers in a multilayer structure, e.g. membrane switches
• CPC Class Codes: H01H 13/785 characterised by the material of the contacts, e.g. conductive polymers
• CPC Class Codes: H01H 2201/036 Variable resistance
• CPC Class Codes: H01H 2209/002 Materials
• CPC Class Codes: H01H 2209/07 metallic
• CPC Class Codes: H01H 2221/062 Damping vibrations
• CPC Class Codes: H01H 2227/002 Layer thickness
• CPC Class Codes: H01H 2227/018 Printed contacts; Metal foil
• CPC Class Codes: H01H 2227/032 Operating force
• CPC Class Codes: H01H 2229/012 Vacuum deposition
• CPC Class Codes: H01H 2229/016 Selective etching
• CPC Class Codes: H01H 2231/034 Coordinate determination
• CPC Class Codes: H01H 2239/006 Containing a capacitive switch or usable as such
• CPC Class Codes: Y10T 29/435 Solid dielectric type

Abstract

A touch selection pad contains a matrix of tactile sensors each of which contains a composite material with a pressure and direction-dependent electric conductivity and a dielectric material forming a capacitor. These are provided with column electrodes and row electrodes. When touched, each of the sensors creates a series circuit comprising a resistor formed of the composite material and a capacitor formed from the dielectric having a capacitance of preferably at least 50 pF. In this matrix of tactile sensors, the pressure-dependent resistance together with the associated fixed capacity serves as the measuring variable. The touch pad due to the small spacing between the sensors has a high resolution. It can be produced in a simple manner by sequentially depositing layers on a metalized carrier by means of a thin-film technique. The row and column electrodes can be etched out of a metalized plastic cover layer and a metalized carrier, respectively, by micro structuring techniques.

Claims

1. A touch selection pad comprising:

(a) a matrix of tactile sensors arranged into rows and columns, each tactile sensor comprising a series circuit of a variable resistance which is part of a layer of composite material which has a pressure dependent conductivity and a capacitor comprising a layer of dielectric material having a capacitance of at least fifty picofarads;

(b) a plurality of row electrodes coupled to the rows of the matrix of tactile sensors and

(c) a plurality of column electrodes coupled to the columns of the matrix of tactile sensors.

2. The touch selection pad according to claim 1, wherein the capacitance of the capacitor of the dielectric material is at least five hundred picofarads.

3. The touch selection pad according to claim 1, wherein the dielectric material has a dielectric constant of at least 1000.

4. The touch selection pad according to claim 3, wherein the dielectric material comprises ceramic material, formed into strip-shaped bodies arranged between the column electrodes and the composite material.

5. The touch selection pad according to claim 1, wherein the dielectric material has a flat metalized side, the column electrodes being formed by mechanically severing the metalization of the metalized flat side of the dielectric material.

6. The touch selection pad according to claim 1, wherein the dielectric material has a flat metalized side facing the composite material, the metalization of the flat metalized side of the dielectric material being mechanically severed, the severed metalized side of the dielectric material forming strip-shaped metallic spacers between the composite material and the dielectric material.

7. The touch selection pad according to claim 1, wherein the composite material has a flat side, and wherein the row electrodes are strip-shaped and coupled to the flat side of the composite material, an electrically insulating covering covering the strip-shaped row electrodes and exposed portions of the flat side of the composite material.

8. The touch selection pad according to claim 7, wherein the electrically insulating covering has a flat side facing away from the strip-shaped row electrodes and the flat side of the composite material, the flat side of the electrically insulating covering being metalized, with the metalized flat side of the covering being electrically grounded.

9. A method of manufacturing a touch selection pad on a carrier comprising a matrix of tactile sensors arranged into rows and columns, a plurality of row electrodes coupled to the rows of the matrix of tactile sensors and a plurality of column electrodes coupled to the columns of the matrix of tactile sensors, comprising the steps of:

(a) metalizing a carrier using thin-film metalization processes;

(b) etching grooves into the metalization of the metalized carrier to form the column electrodes;

(c) applying a dielectric material as a layer over the remaining metalized portions of the carrier by thin film application processes;

(d) covering the dielectric material layer with a composite material;

(e) forming an electrically insulating covering having a flat side;

(f) applying the row electrodes to said covering; and

(g) covering the composite material with the flat, row electrode side of the electrically insulating covering.

10. The method of manufacturing a touch selection pad according to claim 9, wherein the formation of column electrodes occurs after the application of the dielectric layer of the carrier such that the grooves are etched through both the dielectric material layer and the metalization of the metalized carrier forming strip-shaped column electrodes and corresponding strip-shaped dielectric material regions.

11. The method of manufacturing a touch selection pad according to claim 10, wherein, after the dielectric material layer is applied to the carrier, the dielectric material layer is metalized, and the formation of column electrodes is performed after the formation of the dielectric material layer and its metalization such that the grooves are etched through the metalized dielectric material layer and the metalization of the metalized carrier forming strip-shaped column electrodes and corresponding metalized strip-shaped dielectric material regions.

12. The method of manufacturing a touch selection pad according to claim 11, wherein the metalization of the dielectric material layer occurs after the application of an electrically conducting adhesion layer to the dielectric material layer such that the metalization of the dielectric material layer is of the electrically conducting adhesion layer applied to the dielectric material layer.

13. The method of manufacturing a touch selection pad according to claim 10, wherein the metalizing of the carrier comprises metalizing with copper.

14. The method of manufacturing a touch selection pad according to claim 10, wherein the metalizing of the carrier forms a conductive layer having a maximum thickness of one micrometer.

15. The method of manufacturing a touch selection pad according to claim 10, wherein the dielectric material layer comprises titanium dioxide.

16. The method of manufacturing a touch selection pad according to claim 15, wherein the titanium dioxide dielectric material layer has a maximum thickness of five hundred nanometers.

17. The method of manufacturing a touch selection pad according to claim 10, wherein the dielectric material layer comprises an oxide of silicon.

18. The method of manufacturing a touch selection pad according to claim 17, wherein the oxide of silicon layer of dielectric material has a maximum thickness of one hundred nanometers

19. A method of manufacturing a touch selection pad according to claim 9 wherein the metalization of the carrier is performed after an electrically conducting adhesion layer is applied to the carrier such that the metalization of the carrier is of the electrically conducting adhesion layer applied to the carrier.

20. The method of manufacturing a touch selection pad according to claim 19, wherein the electrically conducting adhesion layer is applied to the carrier by sputtering.

21. The method of manufacturing a touch selection pad according to claim 19, wherein the electrically conducting adhesion layer is applied to the carrier by vapor deposition.

22. The method of manufacturing a touch selection pad according to claim 19, wherein the electrically conducting adhesion layer comprises titanium.

23. The method of manufacturing a touch selection pad according to claim 19, wherein the electrically conducting adhesion layer comprises chrominum.

24. The method of manufacturing a touch selection pad according to claim 19 wherein the electrically conducting adhesion layer is applied to the carrier to a maximum thickness of fifty nanometers.