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Self substrate bias generator formed in a well

  • US 4,740,715 A
  • Filed: 09/16/1986
  • Issued: 04/26/1988
  • Est. Priority Date: 09/19/1985
  • Status: Expired due to Term
First Claim
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1. A self substrate bias generator comprising:

  • a semiconductor substrate of a first conductivity type;

    means for supplying first and second signals having substantially opposite phases;

    a first capacitor in which said first signal is supplied to one electrode and the other electrode is connected to a first node;

    a second capacitor in which said second signal is supplied to one electrode and the other electrode is connected to a second node;

    a well of a second conductivity type formed in said semiconductor substrate; and

    first to fourth MOS transistors formed in said well,wherein a current path of said first MOS transistor is connected between the substrate and said first node and its gate is connected to the first node,a current path of said second MOS transistor is connected between the substrate and said second node and its gate is connected to the second node,a current path of said third MOS transistor is connected between a predetermined potential and said first node and its gate is connected to the second node, anda current path of said fourth MOS transistor is connected between said predetermined potential and said second node and its gate is connected to the first node.

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