Method for producing recessed field oxide with improved sidewall characteristics

• US 4,746,630 A
• Filed: 09/17/1986
• Issued: 05/24/1988
• Est. Priority Date: 09/17/1986
• Status: Expired due to Fees

• Current Assignee: HP Inc.
• Original Assignee: Hewlett-Packard Company (HP Inc.)
• Inventors: Hui, Chi-Hung, Moll, John L., Voorde, Paul V.
• Primary Examiner(s): Morgenstern, Norman
• Assistant Examiner(s): Burke, Margaret
• Application Number:
  US06/908,485
• Time in Patent Office: 615 Days
• Field of Search: 427/85, 427/93, 427/94, 427/154, 427/399, 427/271, 427/272, 427/419.2, 427/419.3, 427/419.7, 357/47, 357/49, 357/50, 148/DIG. 86, 148/DIG. 117, 437/235, 437/238, 437/241, 437/242, 437/243
• US Class Current: 438/439
• CPC Class Codes: H01L 21/3081 characterised by their composition, e.g. multilayer masks, materials
• CPC Class Codes: H01L 21/32 using masks
• CPC Class Codes: H01L 21/76205 in a region being recessed from the surface, e.g. in a recess, groove, tub or trench region
• CPC Class Codes: Y10S 438/954 Making oxide-nitride-oxide device

Abstract

A method for producing field oxide in a silicon substrate by forming a thin oxide layer over the surface of the substrate, forming a thin nitride layer over the thin oxide layer, forming a thick oxide over the thin nitride layer, forming a thick nitride layer over the thick oxide layer; patterning all four of the layers to espose the surface of the substrate where the field oxide is to be formed; and growing the field oxide. Preferably, before the field oxide is grown, trenches are formed into the substrate so that the upper surfaces of the field oxide are substantially planar with the upper surfaces of the substrate. The thin oxide layer minimizes bird beak formation, and eases the removal of the oxide/nitride/oxide/nitride layers. The resultant structure is both planar and bird'"'"'s beak-free, and is therefore well suited to producing VLSI components having dimensions less than 0.5 microns.

Claims

1. A method for producing field isolation regions for a silicon-based semicondutor substrate comprising:

forming four-layer blocking structures over field regions of said substrate by;

forming a first insulation layer of a silicon oxide over a surface of said substrate;

forming a first inhibiting layer of a silicon nitride over said first insulation layer;

forming a second insulation layer of a silicon oxide over said first inhibiting layer, said second insulation layer being thicker than said first insulation layer;

forming a second inhibiting layer of a silicon nitride over said second insulation layer, said second inhibiting layer being thicker than said first inhibiting layer;

patterning said first insulation layer, said first inhibiting layer, said second insulation layer, and said second inhibiting layer such that portions of said substrate surface where said isolation regions are to be formed become uncovered, and such that remaining portions of said substrate surface are covered by four layer insulation/inhibiting/insulation/inhibiting blocking structures; and

forming field isolation regions at portions of said surface of said substrate which are not covered by said blocking structures.

2. A method as recited in claim 1 wherein said first insulation layer and said second insulation layer are formed by vapor deposition.

3. A method as recited in claim 1 wherein said first inhibiting layer and said second inhibiting layer are formed by vapor deposition.

4. A method as recited in claim 1 wherein said isolation regions are grown into said surface of said substrate.

5. A method as recited in claim 1 wherein said isolation regions are grown in an oxidizing environment at higher than ambient temperatures.

6. A method as recited in claim 1 further comprising implanting a doping substance into said substrate where the isolation regions will be subsequently formed.

7. A method as recited in claim 6 further comprising forming trenches in said surface of said substrate where said isolation regions are to be subsequently formed, such that the upper surfaces of said isolation regions and said surface of said substrate are substantially planar.

8. A method as recited in claim 1 further comprising forming trenches in said substrate where said isolation regions are to be subsequently formed, such that the upper surfaces of said isolation regions and said surface of said substrate are substantially planar.

9. A method for producing field oxide for a silicon substrate, said method comprising:

forming a first silicon oxide layer over said surface of said substrate;

forming a first silicon nitride layer over said first oxide layer;

forming a second silicon oxide layer over said first nitride layer, said second oxide layer being thicker than said first oxide layer;

forming a second silicon nitride layer over said second oxide layer, said second nitride layer being thicker than said first nitride layer;

patterning said first oxide layer, said first nitride layer, said second oxide layer, and said second nitride layer to expose said surface of said substrate where said field oxide is to be formed such that remaining portions of said substrate surface are covered by a four layer oxide/nitride/oxide/nitride structure; and

forming said field oxide.

10. A method as recited in claim 9 further comprising forming trenches into said surface of said substrate where said field oxide is to be subsequently formed.

11. A method as recited in claim 9 further comprising implanting boron into said substrate where said field oxide is to be subsequently formed.

12. A method as recited in claim 9 wherein said first oxide layer, said first nitride layer, said second oxide layer, and said second nitride layer are formed by vapor deposition;

and wherein said field oxide is grown in an oxidizing enviroment at elevated temperatures.

13. A method as recited in claim 9 further comprising removing said first oxide layer, said first nitride layer, said second oxide layer, and said second nitride layer after forming said field oxide, whereby the upper surfaces of said field oxide are substantially planar with said surface of said substrate.