Intense laser irradiation using reflective optics

• US 4,749,840 A
• Filed: 05/16/1986
• Issued: 06/07/1988
• Est. Priority Date: 05/16/1986
• Status: Expired due to Fees

• Current Assignee: Image Micro Systems Incorporated 900 Middlesex TPK Billerica, IMS Incorporated (Wesco International Incorporated)
• Original Assignee: Image Microsystems
• Inventors: Piwczyk, Bernhard
• Primary Examiner(s): Albritton, C. L.
• Application Number:
  US06/864,448
• Time in Patent Office: 753 Days
• Field of Search: 219/121 LJ, 219/121 LQ, 219/121 L, 219/121 LM, 219/121 LS, 219/121 LT, 219/121 LZ, 219/121 LK, 219/121 LL, 219/121 LH, 350/613, 350/620, 372/101, 372/108
• US Class Current: 219/121.68
• CPC Class Codes: B23K 2101/40 Semiconductor devices
• CPC Class Codes: B23K 26/02 Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam

Abstract

Intense far-ultraviolet laser radiation is applied to a workpiece in performance of processes in the fabrication of integrated circuits, including processes of ablation, deposition, impurity implantation and radiation induced chemical processes. Other processes where intense far-ultraviolet laser radiation is applied include hardening and annealing a workpiece by exposure to the radiation. Particular embodiments of the invention herein enables selective removal of a polymer film on a semiconductor substrate by ablative photodecomposition (APD) using intense far-ultraviolet, or shorter wave length, radiation from a pulsed laser requires focusing the laser radiation to provide sufficiently high fluence of laser light energy to ablate a selected area of the polymer to a useful depth in a reasonable time, sometimes referred to as the threshold of fluence of the laser pulses required to produce effective APD of the polymer. This is done with a reflective objective lens system between the laser and the polymer film that focuses the laser beam on a target area of the film surface to a high fluence image of the beam exceeding the threshold for APD. All optical surfaces of the objective lens system are reflective and so are not damaged by the intense radiation as refractive lenses can be. In a preferred embodiment, the reflective objective lens system includes two reflectors, one large concave reflector with an entrance aperture at the center facing the target and one small centrally-located convex reflector facing away from the target.

Claims

1. An optical system for directing a beam of pulses of relatively intense ultraviolet radiation to a work piece surface comprising,

(a) a source of ultraviolet radiation producing a beam of pulses of substantially monochromatic, directional , ultraviolet radiation of relatively high pulse fluence F₀, on the order of 100 mJ/cm² or greater,

(b) a reflecting objective lens system having an optical input and an optical output, said optical output being immediately adjacent to said work piece surface, said optical input receiving said source radiation of pulses of fluence F₀,

(c) said reflective objective lens system having two or more reflecting surfaces that are highly reflective of said ultraviolet radiation and

(d) at least one of said reflecting surfaces being formed of material that readily withstands said ultraviolet radiation pulses of fluence F₀ incident thereon with negligible degradation of said surface reflectivity,

(e) whereby said reflecting objective lens system focuses said beam pulses on said work piece surface to a fluence F_t, which is subtantially greater than F₀.

2. An optical system as in claim 1 wherein,

(a) said reflecting objective lens system has an optical axis and includes two reflectors facing each other on said optical axis, a large concave reflector and a small convex reflector,

(b) said source radiation is incident first on said small convex reflector and then on said large concave reflector which focuses said radiation on said work piece surface and

(c) said small convex reflector has the reflective surface thereof formed of said material.

3. An optical system as in claim 2 wherein,

(a) said reflective objective lens system optical input includes an entrance aperture at the center of said large concave reflector concentric with said optical axis,

(b) whereby said beam pulses from said source of relatively high fluence F₀ enter said reflecting objective lens system through said entrance aperture.

4. An optical system as in claim 3 wherein,

(a) substantially all of said pulses that enter said reflecting objective lens system optical input through said entrance aperture in said large concave reflector thereof impinge on said small convex reflector and are reflected therefrom to said large concave reflector and reflect therefrom through said optical output to said work piece surface.

5. An optical system as in claim 3 wherein,

(a) said source includes a laser producing a beam of pulses of substantially monochromatic directional ultraviolet radiation and

(b) optical means defining an optical path for said laser beam between said laser and said reflecting objective lens system optical input,

(c) means are provided in said optical path for dividing said laser beam into separate beams along separate paths and

(b) means are provided for directing said separate beams through said entrance aperture in said large concave reflector to opposite sides of the center of said small convex reflector,

(c) whereby said separate beams reflect from said small convex reflector to said large concave reflector and reflect therefrom through said optical output to the same area on said work piece surface.

6. An optical system as in claim 5 wherein said separate beams cross at the same point on said work piece surface.

7. An optical system as in claim 5 wherein said separate beams are substantially the same cross-section shape and size.

8. An optical system as in claim 5 wherein,

(a) said separate beams cross at the same point on said work piece surface and

(b) said separate beams are the same cross-section shape and size at said point on said work piece surface.

9. An optical system as in claim 8 wherein the cross sections of said separate beams are in registration at said point on said work piece surface.

10. An optical system as in claim 9 wherein,

(a) means are provided for making the optical lengths of said separate paths, in terms of the wave length of said laser radiation, different,

(b) whereby the wave fronts of said separate beams at said point on said work piece surface are not in the same phase.

11. An optical means as in claim 8 wherein,

(a) means are provided for making the optical length in terms of the wavelength of said laser radiation of the paths of said separate beams different,

(b) whereby the wave fronts of said separate beams at said points on said work piece surface are not in the same phase.

12. An optical system as in claim 1 including,

(a) a source of visible light,

(b) means for directing said visible light to said reflecting objective lens system through said optical input thereof,

(c) whereby said visible light illuminates said work piece surface and

(d) visible light optical means, including an eyepiece for viewing said work piece surface through said reflecting objective lens system.

13. An optical system as in claim 12 wherein said reflecting objective lens system reflecting surfaces substantially reflect visible light as well as said laser radiation.

14. An optical system as in claim 13 wherein said reflecting objective lens system reflecting surfaces are formed by a layer of material , such as said material, that reflects said laser radiation and with a layer of visible light reflecting material.

15. An optical system as in claim 12 wherein,

(a) said reflecting objective lens system includes two reflectors facing each other on said optical axis, a large concave reflector and a small convex reflector and

(b) said beam radiation is incident first on said small convex reflector and then on said large concave reflector which focuses said radiation on said work piece surface.

16. An optical system as in claim 15 wherein,

(a) visible light that is incident on said workpiece surface reflects from said work piece surface to said large concave reflector and therefrom to said small convex reflector and emerges from said entrance aperture and is directed by said visible light optical means to said eyepiece.

17. An optical system as in claim 15 wherein,

(a) of said visible light directed to said reflecting objective lens system, some is directly intercepted by said small convex reflector thereof and

(b) some is directly intercepted by said work piece surface,

(c) whereby the area of said work piece surface illuminated by said visible light includes the area illuminated by said laser beam and a portion of the area surrounding said area illuminated by said laser beam, all referred to herein as the visible area of said work piece surface.

18. An optical system as in claim 5 including,

(a) a source of visible light,

(b) means for directing said visible light to said reflecting objective lens system through said entrance aperture in said concave reflector thereof,

(c) whereby said visible light illuminates said work piece surface and

(d) visible light optical means, including an eyepiece for viewing said work piece surface through said entrance aperture in said large concave reflector.

19. An optical system as in claim 18 wherein,

(a) visible light that reflects from said work piece surface to said large concave reflector and therefrom to said small convex reflector emerges from said entrance aperture and is directed by said visible light optical means to said eyepiece.

20. An optical system as in claim 19 wherein,

(a) of said visible light directed to said reflecting objective lens system, some is directly intercepted by said small convex reflector thereof and

(b) some is directly intercepted by said work piece surface,

(c) whereby the area of said work piece surface illuminated by said visible light includes the area illuminated by said laser beam and a portion of the area surrounding said area illuminated by said laser beam, all referred to herein as the visible area of said work piece surface.

21. In a system for illuminating the surface of a work piece with radiation of high flux density of magnitude substantially greater than the flux density of said radiation from the source thereof, means for directing and focusing said radiation from said source to said work piece surface comprising,

(a) a source of ultraviolet radiation producing a beam of pulses of substantially monochromatic, directional , ultraviolet radiation of relatively high pulse fluence F₀, on the order of 100 mJ/cm² or greater,

(b) a reflecting objective lens system having an optical input and an optical output, said optical output being immediately adjacent to said work piece surface, said optical input receiving said source radiation of pulses of fluence F₀ ,

(c) said reflecting objective lens system having two or more reflecting surfaces that are highly reflective of said ultraviolet radiation and

(d) at least one of said reflecting surfaces being formed of material that readily withstands said ultraviolet radiation pulses of fluence F₀ incident thereon with negligible degradation of said surface reflectivity,

(e) whereby said reflecting object lens system focuses said beam pulses on said work piece surface to a fluence F_t, which is substantially greater than F₀.

22. A system as in claim 21 wherein,

(a) said reflecting objective lens system has an optical axis and includes two reflectors facing each other on said optical axis, a large concave reflector and a small convex reflector,

(b) said beam radiation is incident first on said small convex reflector and then on said large concave reflector which focuses said radiation on said work piece surface and

(c) said small convex reflector has the reflective surface thereof formed of said material.

23. A system as in claim 22 wherein,

(a) said reflecting objective lens system optical input includes an entrance aperture at the center of said large concave reflector concentric with said optical axis,

(b) whereby said beam pulses from said source of relatively high fluence F₀ enter said reflecting objective lens system through said entrance aperture.

24. A system as in claim 23 wherein,

(a) said source includes a laser producing a beam of pulses of subtantially monochromatic directional ultraviolet radiation and

(b) optical means defining an optical path for said laser beam between said laser and said reflecting objective lens system,

(c) means are provided in said optical path for dividing said laser beam into separate beams along separate paths and

(b) means are provided for directing said separate beams through said entrance aperture in said large concave reflector to opposite sides of the center of said small convex reflector,

(c) whereby said separate beams reflect from said small convex reflector to said large concave reflector and reflect therefrom through said optical output to the same area on said work piece surface.

25. A system as in claim 24 wherein,

(a) said separate beams cross at the same point on said work piece surface and

(b) said separate beams are the same cross-section shape and size at said point on said work piece surface.

26. A system as in claim 21 wherein,

(a) a source of visible light,

(b) means for directing said visible light to said reflecting microscope through said optical input thereof,

(c) whereby said visible light illuminates said work piece surface and

(d) visible light optical means, including an eyepiece for viewing said work piece surface through said entrance apeture in said large concave reflector.

27. A system as in claim 26 wherein said reflecting objective lens system reflectors substantially reflect visible light as well as said laser radiation.

28. A system as in claim 27 wherein said reflecting objective lens system reflecting surfaces are formed by a layer of material , such as said material, that reflects said laser radiation and with a layer of visible light reflecting material.

29. A system as in claim 23 including

(a) a source of visible light,

(b) means for directing said visible light to said reflecting objective lens system through said entrance aperture in said concave reflector thereof,

(c) whereby said visible light illuminates said work piece surface and

(d) visible light optical means, including an eyepiece for viewing said work piece surface through said entrance aperture in said large concave reflector.

30. A system as in claim 29 wherein,

(a) of said visible light directed to said reflecting objective lens system, some is directly intercepted by said small convex reflector thereof,

(b) whereby the area of said work piece surface illuminated by said visible light includes the area illuminated by said laser beam and a portion of the area surrounding said area illuminated by said laser beam, all referred to herein as the visible area of said work piece surface.

31. In a system for causing ablative photodecomposition at the surface of an organic material by pulsed ultraviolet laser radiation from a source of such laser radiation pulses of fluence F₀, the improvement comprising,

(a) a source of said ultraviolet laser radiation producing a beam of pulses of substantially monochromatic, directional , ultraviolet radiation of pulse fluence F₀,

(b) a reflecting objective lens system having an optical input and an optical output, said optical output being immediately adjacent to said work piece surface, said optical input receiving said source radiation pulses of fluence F₀,

(c) said reflecting objective lens system having two or more reflecting surfaces that are highly reflective of said ultraviolet radiation and

(d) at least one of said reflecting surfaces being formed of material that readily withstands said ultraviolet radiation of intensity I₀ incident thereon with negligible degradation of said surface reflectivity,

(e) whereby said reflecting objective lens system focuses said laser beam on said work piece surface to a pulse fluence Ft which is substantially greater than F₀.

32. A system as in claim 31 wherein,

(a) said reflecting objective lens system has an optical axis and includes two reflectors facing each other on said optical axis, a large concave reflector and a small convex reflector,

(b) said beam radiation is incident first on said small convex reflector and then on said large concave reflector which focuses said radiation on said work piece surface and

(c) the reflecting surface of said small convex reflector is formed of said material.

33. A system as in claim 32 wherein,

(a) said reflecting objective lens system optical input includes an entrance aperture at the center of said large concave reflector concentric with said optical axis,

(b) whereby said beam pulses from said source of relatively high fluence F₀ enter said reflecting objective lens system through said entrance aperture.

34. A system as in claim 33 wherein,

(a) said source includes a laser producing a beam of pulses of substantially monochromatic directional far-ultraviolet radiation and

(b) optical means defining an optical path for said laser beam between said laser and said reflecting objective lens system,

(c) means are provided in said optical path for dividing said laser beam into separate beams along separate paths and

(b) means are provided for directing said separate beams through said entrance aperture in said large concave reflector to opposite sides of the center of said small convex reflector,

(c) whereby said separate beams reflect from said small convex reflector to said large concave reflector and reflect therefrom through said optical output to the same area on said work piece surface.

35. A system as in claim 34 wherein,

(a) said separate beams cross at the same point on said work piece surface and

(b) said separate beams are substantially the same cross-section shape and size at said point on said work piece surface.

36. A system as in claim 31 wherein,

(a) a source of visible light,

(b) means for directing said visible light to said reflecting objective lens system through said optical input thereof,

(c) whereby said visible light illuminates said work piece surface and

(d) visible light optical means, including an eyepiece for viewing said work piece surface through said reflecting objective lens system.

37. A system as in claim 36 wherein said reflecting objective lens system reflecting surfaces substantially reflect visible light as well as said laser radiation.

38. A system as in claim 37 wherein said reflecting objective lens system reflecting surfaces are formed by a layer of material such as said material that reflects said laser radiation and with a layer of visible light reflecting material.

39. A system as in claim 33 including

(a) a source of visible light,

(b) means for directing said visible light to said reflecting objective lens system through said entrance aperture in said concave reflector thereof,

(c) whereby said visible light illuminates said work piece surface and

(d) visible light optical means, including an eyepiece for viewing said work piece surface through said entrance aperture in said large concave reflector.

40. A system as in claim 39 wherein,

(a) of said visible light directed to said reflecting objective lens system some is directly intercepted by said small convex reflector thereof,

(b) whereby the area of said work piece surface illuminated by said visible light includes the area illuminated by said laser beam and a portion of the area surrounding said area illuminated by said laser beam, all referred to herein as the visible area of said work piece surface.

41. An optical system for directing a laser beam to a work piece surface comprising,,

(a) a source of laser radiation producing a beam of pulses of substantially monochromatic, directional radiation of relatively high pulse fluence F₀,

(b) a reflecting objective lens system immediately adjacent to the work piece surface, the optical axis of said reflecting ojbective lens system being essentially normal to the plane of said work piece surface,

(c) said source including a laser producing a beam of substantially monochromatic, directional, pulsed radiation and

(d) optical means defining an optical path for said laser beam between said laser and said objective lens system,

(e) whereby said reflecting objective lens system focuses said laser beam on said work piece surface to a pulse fluence F_t which is substantially greater than F₀.

(f) a source of visible light,

(g) means for directing said visible light to said objective lens system,

(h) whereby said visible light illuminates said work piece surface and

(i) visible light optical means, including an eyepiece for viewing said work piece surface through said objective lens system.

42. In a method of selectively removing material from a surface of an organic material by ablative photodecomposition of the material by a pulsed beam of ultraviolet laser radiation from a source of such laser radiation pulses of relatively high fluence F₀, the improvement including the steps of:

(d) intercepting said ultraviolet laser radiation beam of pulses of fluence F₀ by a first relatively small convex reflector that is adjacent to said surface, the optical axis of said first reflector being essentially normal to the plane of said surface and the reflective face thereof facing away from said surface and

(e) intercepting said ultraviolet laser radiation beam that reflect from said first reflector by a second relatively large diameter concave reflector that is optically between said first reflector and said laser, the optical axis of said second reflector being essentially coincident with the optical axis of said first and the reflective face thereof facing toward said surface

(f1) whereby said reflectors focus said laser radiation pulses on said surface to a pulse fluence F_t which is substantially greater than F₀.

43. A method as in claim 42 wherein before step (d),

(c) said laser radiation pulses pass through an entrance aperture at the center of said second reflector concentric with said optical axis.

44. A method as in claim 43 wherein before step (c),

(a) dividing said laser beam into separate beams along separate paths and

(b) then directing said separate beams through said entrance aperture to opposite sides of the center of said first convex reflector,

(f2) whereby said separate beams are focused on the same area on said work piece surface.

45. A method as in claim 44 wherein,

(a1) in said step (a) said laser beam is divided into two separate beams of equal intensity and equal cross section dimensions,

(f3) whereby said separate beams are the same cross-section shape, size and intensity where they are focused on said work piece surface.