×

Interferometer including stationary, electrically alterable optical masking device

  • US 4,750,834 A
  • Filed: 10/05/1987
  • Issued: 06/14/1988
  • Est. Priority Date: 01/07/1986
  • Status: Expired due to Fees
First Claim
Patent Images

1. An interferometer comprising:

  • means for creating a pair of parallel beams of electromagnetic radiation;

    means for causing said beams to interfere and produce an interference pattern;

    a masking device located at a region of interference of said beams for impingement of at least a portion of said interference pattern thereon;

    detecting means associated with said masking device for receiving at least a portion of said interference pattern therefrom,said masking device including structure for selectively directing certain portions of said interference pattern to said detecting means, while preventing other portions of said interference pattern from being directed to said detecting means,there being means for selective alteration of said device for varying the portions of said pattern directed to, and prevented from being directed to, said detecting means,said masking device having--a plurality of masking structures electrically separate from one another; and

    means for effecting electrical connections with each of said structures,each of said structures including a material electrically coupled with said electrical connection means, said material having different optical characteristics to radiation impinging thereon at correspondingly different electrical potentials applied to said electrical connection means.

View all claims
  • 0 Assignments
Timeline View
Assignment View
    ×
    ×