End station for an ion implantation apparatus

• US 4,759,681 A
• Filed: 01/16/1986
• Issued: 07/26/1988
• Est. Priority Date: 01/22/1985
• Status: Expired due to Fees

• Current Assignee: Nissin Electric Company Limited (Sumitomo Corporation)
• Original Assignee: Nissin Electric Company Limited (Sumitomo Corporation)
• Inventors: Nogami, Mamoru
• Primary Examiner(s): Werner, Frank E.
• Application Number:
  US06/819,253
• Time in Patent Office: 922 Days
• Field of Search: 414/403, 414/404, 414/416, 414/417, 414/217, 414/222, 414/223, 414/224, 414/225, 414/744 B, 414/331, 414/278, 414/662, 118/500, 118/728, 118/729, 118/730
• US Class Current: 414/416.03
• CPC Class Codes: H01L 21/67769 Storage means
• CPC Class Codes: H01L 21/67778 involving loading and unloading of wafers
• CPC Class Codes: Y10S 414/137 including means for charging or discharging wafer cassette

Abstract

An end station for ion implantation apparatus comprising an ion implantation process unit having a wafer holder and capable of implanting ions in wafers in a high vacuum, and a wafer supply-collection unit for the process unit. The wafer supply-collection unit comprises:

(a) a plurality of cassettes being capable of accommodating wafers in a plurality of stages,

(b) devices for lifting and lowering the cassette for delivering or accommodating wafers one by one,

(c) stockers equal in number to the number of cassettes for accommodating wafers in a plurality of stages and for accommodating dummy wafers when required,

(d) devices for lifting and lowering the stocker for accommodating or delivering wafers one by one,

(e) devices extending from the cassette to the ion implantation process station via the stocker and capable of transporting wafers in the direction of reciprocation, and

(f) control devices for controlling the operation of the devices described in (b), (d) and (e) above for collecting the wafer from the desired cassette and replacing in the same original supply cassette at its original position after processing thus, enabling the wafer production line to achieve an improved operation efficiency.

Claims

1. An end station for an ion implantation apparatus comprising an ion implantation process unit having a wafer holder, said unit being capable of implanting ions in wafers in a high vacuum, and a wafer supply-collection unit for the process unit, the wafer supply-collection unit comprising:

(a) a plurality of cassettes comprising means for accommodating wafers in a plurality of first positions therein before ion implantation;

(b) means for sequentially lifting and lowering each of said cassettes for delivery or for accommodating wafers individually;

(c) a plurality of stockers equal in number to the number of cassettes for accommodating wafers from said cassettes in a plurality of positions therein, and for accommodating dummy wafers, which are not to be processed, when required;

(d) means for sequentially lifting and lowering each of said stockers for accommodating or delivering wafers individually;

(e) means for reciprocally transporting wafers between said cassettes and said ion implantation process unit, said transporting means extending from said plurality of cassettes to the ion implantation process unit via each of said stockers, wherein each of said stockers comprises means for receiving unprocessed wafers from said cassettes and for receiving processed wafers from said ion implantation process unit; and

(f) means for controlling the operation of said means for lifting and lowering each of said cassettes, wherein said controlling means, said means for lifting and lowering each of said stockers, and said means for reciprocally transporting wafers, together comprise means for collecting the wafers from a desired cassette and for replacing said wafers in the same cassette at a plurality of predetermined second positions therein after processing.

2. An end station as defined in claim 1, wherein the control means comprises means for giving an instruction so that wafers from the desired cassette are replaced into the same cassette at said plurality of second positions therein after having been treated in the process unit, wherein said plurality of first positions and said plurality of second positions are the same.

3. An end station as defined in claim 1, wherein the wafer holder in the ion implantation process unit for ion implantation comprises a disk for holding a plurality of wafers thereon.

4. An end station as defined in claim 3, wherein said disk comprises at least nine positions for holding said wafers thereon.

5. An end station as defined in claim 1, wherein the wafer holder in the ion implantation process unit comprises a platen for retaining wafers individually.

6. An end station as defined in claim 1, wherein the cassette comprises a rack structure.

7. An end station as defined in claim 1, wherein each said means for lifting and lowering each of said cassettes and each of said stockers comprises a driver and a lift portion operable by said driver.

8. An end station as defined in claim 1, wherein each of said stockers comprises a rack, said rack comprising a plurality of oppositely positioned shelf portions.

9. An end station as defined in claim 8, wherein each of said stockers further comprises means for stably retaining each of the wafers to be accommodated therein.

10. An end station as defined in claim 9, wherein said retaining means comprises a plurality of arc shaped recessed portions formed in said shelf portions.

11. An end station as defined in claim 1, wherein said means for transporting said wafers comprises a belt.

12. An end station as defined in claim 1, wherein each of said stockers comprises an upper shelf and a lower shelf, each of said upper shelves accommodates a plurality of dummy wafers and each of said lower shelves accommodates a plurality of wafers corresponding to at least the total number of wafers being accommodated in each of said cassettes.

13. An end station as defined in claim 1, wherein each of said cassettes accommodates at least twenty-five wafers.

14. An end station for an ion implantation apparatus comprising an ion implantation process unit having a wafer holder and capable of implanting ions in wafers in a high vacuum, and a wafer supply-collection unit for the process unit, the wafer supply-collection unit comprising:

(a) a plurality of cassettes, each of said cassettes comprising means for accommodating a plurality of wafers in a plurality of first positions therein before ion implantation, at least one of said cassettes comprising a rack;

(b) means for sequentially lifting and lowering each of said cassettes for delivery or accommodating individual wafers;

(c) a plurality of stockers equal in number to the number of cassettes for accommodating wafers from said cassettes in a plurality of positions therein and for accommodating a plurality of dummy wafers, said dummy wafers comprising wafers which are not to be processed by said ion implantation process unit;

(d) means for sequentially lifting and lowering each of said stockers for accommodating or delivering wafers individually;

(e) means for reciprocally transporting wafers, said transporting means extending from said plurality of cassettes to the ion implantation process unit via each of said stockers, and comprising means for transporting wafers from said cassettes via said stockers to said ion implantation process unit; and

(f) means for controlling the operation of said means for lifting and lowering each of said cassettes and said means for lifting and lower each of said stockers, wherein said controlling means, and said means for reciprocally transporting wafers, together comprise means for collecting the wafers from a desired cassette and for replacing said wafers in the same cassette at a plurality of second positions therein after processing, said stockers comprising means for receiving unprocessed wafers from said cassettes and for receiving processed wafers from said ion implantation process unit;

wherein each of said stockers comprises means for supplying at least one of said dummy wafers to at least one position on said wafer holder to satisfy any numerical deficiency in the supply of said wafers from one of said cassettes.

15. An end station in accordance with claim 14, wherein each of said cassettes comprises means for accommodating at least 25 wafers in a plurality of first positions.

16. An end station in accordance with claim 15 wherein said wafer holder comprises means for holding at least 9 wafers such that only 9 wafers are processed at a single time.

17. An end station for an ion implantation apparatus in accordance with claim 14 wherein said plurality of first positions and said plurality of said second positions are identical.