Mass spectrometer
First Claim
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1. In a mass spctrometer comprising:
- (a) means for generating a high-temperature plasma in a flow of carrier gas by means of an inductively-coupled radio-frequency electrical generator;
(b) means for introducing a sample into said plasma;
(c) a sampling member having a front surface adjacent said plasma, a rear surface, and a hole connecting said front and rear surfaces through which ions formed in said plasma can pass;
(d) a chamber having a wall comprising said rear surface;
(e) means for maintaining the pressure in said chamber substantially below atmospheric pressure; and
(f) means for causing at least some of the ions entering said chamber through said hole to enter a mass analyzer;
the improvement comprising the provision by polishing of a smooth area with a surface finish of 5 microns or less on said rear surface at least in the vicinity of said hole.
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Abstract
The invention provides a mass spectrometer adapted for the elemental analysis of a sample in which ions are formed from the sample in an inductively coupled plasma (ICP). The flame of the plasma (14) is directed against the front surface (30) of a cone (19), and ions are sampled from the plasma through a hole (16) in the apex of the cone. In order to reduce the intensity of the background mass spectra, the rear surface (32) of the inside of the cone is polished to a surface finish of 5 microns or better, at least in the vicinity of the hole.
24 Citations
6 Claims
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1. In a mass spctrometer comprising:
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(a) means for generating a high-temperature plasma in a flow of carrier gas by means of an inductively-coupled radio-frequency electrical generator; (b) means for introducing a sample into said plasma; (c) a sampling member having a front surface adjacent said plasma, a rear surface, and a hole connecting said front and rear surfaces through which ions formed in said plasma can pass; (d) a chamber having a wall comprising said rear surface; (e) means for maintaining the pressure in said chamber substantially below atmospheric pressure; and (f) means for causing at least some of the ions entering said chamber through said hole to enter a mass analyzer; the improvement comprising the provision by polishing of a smooth area with a surface finish of 5 microns or less on said rear surface at least in the vicinity of said hole. - View Dependent Claims (2, 3, 4)
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5. A method of reducing the intensity of at least part of the background spectrum observed on a mass spectrometer in which samples are ionized by means of an inductively-coupled plasma discharge in a carrier gas, and in which ions are sampled from said plasma through a hole in a sampling member, said sampling member having a front surface adjacent said plasma and a rear surface which forms part of the wall of an evacuated chamber containing means for causing the ions sampled through said hole to enter a mass analyzer, said method comprising polishing said rear surface at least adjacent to said hole until the surface finish on said rear surface is 5 microns or less.
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6. A method according to claim 9 in which said polishing extends from said hole at least as far as a region in and beyond which substantially no ions formed enter said mass analyser.
Specification