Semiconductor device and process for producing the same
First Claim
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1. A semiconductor device comprising:
- a semiconductor substrate having a semiconductor element formed in a semiconductor active region;
a multilayer wiring structure comprised of an insulator film and an electrically conductive electric wiring which are stacked one upon the other on the surface of said semiconductor substrate;
a bump electrode for transferring an electric signal which is electrically connected to said electric wiring in said multilayer wiring structure; and
a bump electrode for heat dissipation formed on the surface of said multilayer wiring structure through a thin diamond film as a ground layer.
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Abstract
A semiconductor device having improved heat-dissipating characteristics employs a thin insulator film made of diamond, which has excellent thermal conductivity, as an insulator film which is formed on a chip immediately below a heat-dissipating bump electrode. Since the thin diamond film has excellent insulating properties and high thermal conductivity, it is possible to improve heat-dissipating characteristics of even a high-power semiconductor device such as a multichip module. In the case of, particularly, a multichip module, the insulation between a mother chip and a child chip can also be ensured by the presence of the thin diamond film.
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Citations
5 Claims
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1. A semiconductor device comprising:
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a semiconductor substrate having a semiconductor element formed in a semiconductor active region; a multilayer wiring structure comprised of an insulator film and an electrically conductive electric wiring which are stacked one upon the other on the surface of said semiconductor substrate; a bump electrode for transferring an electric signal which is electrically connected to said electric wiring in said multilayer wiring structure; and a bump electrode for heat dissipation formed on the surface of said multilayer wiring structure through a thin diamond film as a ground layer.
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2. A semiconductor device comprising:
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a semiconductor chip having at least a semiconductor substrate having a semiconductor element formed in a semiconductor active region, a multilayer wiring structure comprised of an insulator film and an electrically conductive electric wiring which are stacked one upon the other on the surface of said semiconductor substrate, a bump electrode for transferring an electric signal which is electrically connected to said electric wiring in said multilayer wiring structure, and a bump electrode for heat dissipation formed on the surface of said multilayer wiring structure through a thin diamond film as a ground layer; and a mother chip having an electric wiring region formed in a semiconductor employed as a substrate material, a bump electrode for transfering an electric signal which is electrically connected to said electric wiring region, and a bump electrode for heat dissipation which is formed on the surface of said electric wiring region through a thin diamond film as a ground layer, the respective bump electrodes of said semiconductor chip and said mother chip being welded together.
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3. A semiconductor device comprising:
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a semiconductor chip having at least a semiconductor substrate having a semiconductor element formed in a semiconductor active region, a multilayer wiring structure comprised of an insulator film and an electrically conductive electric wiring which are stacked one upon the other on the surface of said semiconductor substrate, a bump electrode for transferring an electric signal which is electrically connected to said electric wiring in said multilayer wiring structure, and a bump electrode for heat dissipation formed on the surface of said multilayer wiring structure through a thin diamond film as a ground layer; and a mother chip having a semiconductor element with a circuit function provided on a semiconductor substrate, an electric wiring region provided on the surface of said substrate, a pad electrode which is electrically connected to said electric wiring region and to which an external lead is secured, a bump electrode for transferring an electric signal which is electrically connected to said electric wiring region, and a bump electrode for heat dissipation which is formed on the surface of said electric wiring region through a thin diamond film as a ground layer, the respective bump electrodes of said semiconductor chip and said mother chip being welded together.
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4. A semiconductor device comprising:
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a semiconductor chip having at least a semiconductor substrate having a semiconductor element formed in a semiconductor active region, a multilayer wiring structure comprised of an insulator film and an electrically conductive electric wiring which are stacked one upon the other on the surface of said semiconductor substrate, a bump electrode for transferring an electric signal which is electrically connected to said electric wiring in said multilayer wiring structure, and a bump electrode for heat dissipation formed on the surface of said multilayer wiring structure through a thin diamond film as a ground layer; a mother chip having an electric wiring region formed on a semiconductor employed as a substrate material, a bump electrode for transferring an electric signal which is electrically connected to said electric wiring region, and a bump electrode for heat dissipation which is formed on the surface of said electric wiring region through a thin diamond film as a ground layer; a board and cap for a package; an external lead electrically connected to said electric wiring on said mother chip; and a heat-dissipating fin rigidly secured to said package board, the respective bump electrodes of said semiconductor chip and said mother chip being welded together in one unit which is secured to said package board and hermetically sealed by said package cap.
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5. A process for producing a semiconductor device, comprising the steps of:
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preparing a mother chip having an electric wiring region formed on a semiconductor employed as a substrate material, a bump electrode for transferring an electric signal which is electrically connected to said electric wiring region, and a bump electrode for heat dissipation which is formed on the surface of said electric wiring region through a thin diamond film as a ground layer, and a semiconductor chip having at least a semiconductor substrate having a semiconductor element formed in a semiconductor active region, a multilayer wiring structure composed of an insulator film and an electrically conductive electric wiring which are stacked one upon the other on the surface of said semiconductor substrate, a bump electrode for transferring an electric signal which is electrically connected to said electric wiring in said multilayer wiring structure, and a bump electrode for heat dissipation formed on the surface of said multilayer wiring structure through a thin diamond film as a ground layer, the respective bump electrodes of said semiconductor chip and said mother chip being welded together in one unit; rigidly securing said mother chip to which is secured said semiconductor chip to a board of a package, and securing an external lead to said electric wiring region on said mother chip; hermetically sealing said mother chip, having said semiconductor chip secured thereto, with a cap for the package; and rigidly securing a heat-dissipating fin to said package board.
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Specification