Non-uniform gas inlet for dry etching apparatus
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Accused Products
Abstract
A gas inlet having a non-uniform array of inlet holes for the non-uniform introduction of an etching gas into a reaction chamber of a dry etching apparatus. The non-uniform introduction of gas compensates for non-uniform characteristics in the dry etching apparatus resulting in a uniform etch.
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Current AssigneeMotorola, Inc. (Motorola Solutions, Inc.)
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Original AssigneeTegal Corp. (Rennova Health, Inc.)
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InventorsStark, Mark M., Warenback, Douglas H., Drage, David J.
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Primary Examiner(s)Schor, Kenneth M.
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Assistant Examiner(s)DANG, THI D
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Application NumberUS07/048,344Time in Patent Office533 DaysField of Search156/643, 156/345, 156/646, 204/298US Class Current156/345.34CPC Class CodesH01J 37/3244 Gas supply means
