Method for measuring dimensions of fine pattern

• US 4,790,023 A
• Filed: 03/09/1987
• Issued: 12/06/1988
• Est. Priority Date: 03/10/1986
• Status: Expired due to Term

• Current Assignee: Fujitsu Limited
• Original Assignee: Fujitsu Limited
• Inventors: Kobayashi, Kenichi, Matsui, Shougo
• Primary Examiner(s): Boudreau, Leo H.
• Application Number:
  US07/023,493
• Time in Patent Office: 638 Days
• Field of Search: 382/25, 382/8, 358/101, 358/106, 358/107
• US Class Current: 382/149
• CPC Class Codes: G01B 11/024 by means of diode-array scanning

Abstract

A method for measuring the dimensions of a fine pattern, comprises first measuring a surface area and determining a profile of a displayed pattern image, second, calculating the center of gravity of the pattern image, third, calculating an equivalent diameter of a circular pattern having the same surface area as the pattern image, fourth, calculating a mean value of pattern lengths of lines which all pass through the center of gravity of the pattern image and which intersect the pattern image at two intersecting points; and fifth, comparing the mean value with the equivalent diameter of the circular pattern image. The pattern lengths are defined as distances between the two intersecting points.

Claims

1. A method for measuring dimensions of a fine pattern, comprising:

calculating a surface area and determining a profile of a displayed pattern image;

calculating a center of gravity in the pattern image;

calculating an equivalent diameter of a circular pattern having the same surface area as the pattern image;

calculating a mathematical mean value of pattern lengths of lines which all pass through the center of gravity of the pattern image and which intersect the pattern image at two points of the profile, said pattern lengths being defined as distances between the two points; and

comparing the means value with the equivalent diameter of the circular pattern image.

2. A method according to claim 1, wherein said pattern image is displayed on a display unit by means of an optical image forming system.

3. A method according to claim 2, further comprising adjusting the optical image forming system in accordance with the result of said comparison of the mean value and the equivalent diameter.

4. A method according to claim 3, wherein said optical image forming system comprises an optical image sensor having a large number of photoelectric picture elements and wherein the step of calculating the surface area of the pattern image comprises counting the number of picture elements.