Electro-optical device

• US 4,790,635 A
• Filed: 04/24/1987
• Issued: 12/13/1988
• Est. Priority Date: 04/25/1986
• Status: Expired due to Term

• Current Assignee: Qinetiq Limited (QinetiQ Group PLC)
• Original Assignee: The secretary of state for defence in her Britannic Majesty's Government of the United Kingdom of Great Britain And Northern Ireland
• Inventors: Apsley, Norman
• Primary Examiner(s): LaRoche, Eugene R.
• Assistant Examiner(s): NOT, DEFINED
• Application Number:
  US07/042,342
• Time in Patent Office: 599 Days
• Field of Search: 350/355, 350/356, 350/354, 350/164, 350/166, 332/7.51, 357/30 B, 357/30 E, 357/30 L
• US Class Current: 359/260
• CPC Class Codes: G02F 1/218 using semi-conducting materials

Abstract

An electro-optical device is arranged as a Fabry Perot etalon comprising two mirrors and a central region. The mirrors are multilayer heterostructures of Al_x Ga_1-x As semiconductor materials where x alternates between 1.0 and 0.3. The central region may be a multiple quantum well structure of Al_x Ga_1-x As where x alternates between 0 and 0.3. The etalon material doping is non-uniform so that it is electrically a semiconductor device with a biasable central region. The optical path length in the central region is electric field dependent, and the etalon transmission or reflection is accordingly modulatable by varying the central region bias. The mirrors may be heavily doped and of opposite conductivity type with the central region undoped. This provides a PIN diode. Light incident on the etalon executes multiple transits of the central region. It is therefore unnecessary to employ long path lengths and high fields to enhance weak electro-optical effects in order to produce significant modulation, this being necessary in prior art devices.

Claims

1. In an electro-optical device comprising a Fabry-Perot etalon having a central region of electro-optic material between two mirrors of multilayer construction, and electrical biasing means, connected to the mirrors, for applying a variable bias to the mirrors to vary the refractive index of the central region and thereby the etalon fringe maximum wavelength, the improvement wherein:

(1) the central region and the mirrors are a heterostructure of successively deposited layers of semiconductor materials,

(2) the mirrors are doped to have mutually opposite conductivity type and the central region has lower doping than the mirrors to provide a PIN diode structure in which bias voltage applied by the biasing means appears predominantly across the central region,

(3) the etalon has an interference fringe maximum in the vicinity of a central region optical absorption wavelength associated with electric field dependent refractive index, and

(4) the biasing means is arranged to reverse bias the PIN diode structure.

2. A device according to claim 1, wherein each mirror comprises alternately arranged layers of two semiconductor materials.

3. A device according to claim 2, wherein the mirror layers are of Al_x Ga_1-x As where the value of the compositional parameter x alternates between two values.

4. A device according to claim 3, wherein the two values of x are 1.0 and 0.3.

5. A device according to claim 2, wherein the central region comprises at least one quantum well.

6. A device according to claim 5, wherein the central region is formed of two semiconductor materials of the Al_x Ga_1-x As system where the value of the compositional parameter X alternates between two values.

7. A device according to claim 2, wherein the central region comprises quantum wells of one semiconductor material arranged alternately with barrier layers of a second semiconductor material.

8. A device according to claim 1 including optical and electrical isolating means extending through the central region and at least one mirror, and divided thereby into an array of pixels.

9. A device according to claim 8, wherein each of said pixels is surmounted by and in series with a respective photoconductive layer, the device providing a light value for radiation incident on the photoconductive layers.

10. A device according to claim 9, including biasing means arranged to vary device bias in accordance with average radiation intensity such that the device is selectively responsive to scene contrast.

11. A device according to claim 8, including a respective layer of radiation absorbing material surmounting and in contact with each of said pixels to provide thermal imaging properties.

12. In an electro-optical device comprising a Fabry-Perot etalon having a central region of electro-optic material between two mirrors of multilayer construction, and electrical biasing means, connected to the mirrors, for applying a variable bias to the mirrors to vary the central region refractive index and thereby the etalon fringe maximum wavelength, the improvement wherein:

(1) the central region and the mirrors are a heterostructure of successively deposited layers of semiconductor materials,

(2) the mirrors are doped to have like conductivity type,

(3) the central region comprises a heterojunction bipolar transistor having emitter and collector regions of conductivity type equivalent to that of the mirrors but relatively lower doping such that bias voltage applied by the biasing means appears predominantly across the central region,

(4) the transistor has a base region formed of a semiconductor material having opposite conductivity type to and lower energy gap than the emitter and collector regions,

(5) the base region is absorbing at an etalon interference fringe maximum wavelength but the emitter and collector regions are transport at this wavelength, and

(6) the biasing means is arranged to bias the central region to produce phototransistor operation