Gas dispersion disk for use in plasma enhanced chemical vapor deposition reactor
First Claim
1. A gas dispersion disk for use in a chemical vapor transport system exhibiting a gas pressure gradient, comprising a disk having a plurality of apertures formed therein and distributed over the surface thereof so as to have a low aperture area per unit of disk area at disk locations exposed to high gas pressures, and a higher aperture area per unit of disk area at disk locations exposed to lower gas pressures.
1 Assignment
0 Petitions
Accused Products
Abstract
A chemical vapor transport reactor gas dispersion disk (20) for counteracting vapor pressure gradients to provide a uniform deposition of material films on a semiconductor slice (37). The disk (20) has a number of apertures (22) arranged so as to increase in aperture area per unit of disk area when extending from the center of the disk (20) to its outer peripheral edge.
-
Citations
22 Claims
- 1. A gas dispersion disk for use in a chemical vapor transport system exhibiting a gas pressure gradient, comprising a disk having a plurality of apertures formed therein and distributed over the surface thereof so as to have a low aperture area per unit of disk area at disk locations exposed to high gas pressures, and a higher aperture area per unit of disk area at disk locations exposed to lower gas pressures.
-
12. Plasma reactor apparatus for depositing a uniform layer of material on a slice, comprising:
-
an electrode with a gas inlet for providing a gas flow to a reactor chamber of a reactor; a gas distribution plate for distributing the gas emitted from said electrode into said chamber; a gas dispersion disk having a nonuniform apertured area over the surface thereof for counteracting chamber gas pressure gradients so as to provide a uniform gas pressure to said slice; a shower head for dispersing said uniform gas pressure in said chamber to said slice; a spacer for separating said shower head from said gas dispersion disk; a slice holder for holding a slice exposed to said uniform gas pressure; and means for exhausting said gas from said chamber. - View Dependent Claims (13, 14, 15)
-
-
16. A method of dispersing a gas in a chemical vapor transport system exhibiting a gas pressure gradient, comprising the steps of:
separating a gas inlet chamber area which exhibits said pressure gradient from a slice processing area by a barrier for restricting the flow of gas from the inlet chamber area to the slice processing area such that in the high gas pressure areas there is a higher restriction than in low gas pressure areas. - View Dependent Claims (17, 18, 19, 20, 21, 22)
Specification