Extended-range moire contouring

• US 4,794,550 A
• Filed: 10/15/1986
• Issued: 12/27/1988
• Est. Priority Date: 10/15/1986
• Status: Expired due to Fees

• Current Assignee: Eastman Kodak Company
• Original Assignee: Eastman Kodak Company
• Inventors: Greivenkamp, John E. Jr.
• Primary Examiner(s): Lall, Parshotam S.
• Assistant Examiner(s): NOT, DEFINED
• Application Number:
  US06/918,950
• Time in Patent Office: 804 Days
• Field of Search: 364/560, 364/562, 364/563, 364/525, 250/550, 250/237 G, 356/354, 356/355, 356/357, 356/360
• US Class Current: 702/167
• CPC Class Codes: G01B 11/254 Projection of a pattern, viewing through a pattern, e.g. moiré

Abstract

The measurement range of Moire contouring techniques is extended beyond the Nyquist frequency limit by constraining the reconstruction of a surface contour according to a priori knowledge about the surface. In one example the a priori knowledge is that the surface is smooth, being described by a function having continuous derivatives, and the location of a region where the surface changes by less than C/2 per sample. In another example, the a priori knowledge is the location and height of a step discontinuity to within C/2, where C is the contour interval.

Claims

1. A method of Moire contouring comprising the steps of:

a. forming a test pattern of spaced lines having distortions representing a contour of a test surface;

b. forming samples of a Moire pattern representing a product of said test pattern and a reference pattern, representing a reference surface;

c. calculating from said Moire pattern samples, height difference samples representing the difference in height of the test surface and the reference surface said height difference samples being expressed in modulo C, where C is a linear dimension which is a function of the spacing of lines of the test pattern and where said height difference samples can differ by more than C/2 between adjacent samples;

d. reconstructing the surface contour from said height difference samples by adjusting said height difference samples by multiples of C, including the step of applying a constraint based on a priori knowledge of the test surface to correctly reconstruct the surface contour when the height difference samples change by more than C/2 per sample.

2. The method claimed in claim 1, wherein said a priori knowledge of the surface is:

(1) that the test surface is smooth, therefore, the test surface contour being represented by a function having continuous derivatives, and (2) a location of a neighborhood on the test surface where the height difference between the test surface and the reference surface changes by less than C/2 per sample.

3. The method claimed in claim 2, wherein said samples having width and pitch are formed from a sparse array of sampling locations defined by a parameter G being less than 0.5, where G=a/x_s, a is the width of a sample, and x_s is the pitch of samples in the array.

4. The method claimed in claim 3, wherein G=0.1.

5. The method claimed in claim 1, wherein said a priori knowledge of the test surface further includes the location and height of a step discontinuity to within less than C.

6. The method claimed in claim 1, wherein said a priori knowledge of the surface comprises design specifications and manufacturing tolerances.

7. The method claimed in claim 1, wherein said Moire contouring method is Moire topography, said test pattern being formed by projecting a grid pattern having a period d onto the surface of a diffusely reflecting object, the samples of said Moire pattern being formed by viewing said surface with an image sensor having an array of image sensing elements along a viewing axis at an angle θ

from a direction of projection of said grid pattern, and

space="preserve" listing-type="equation">C=d/tan θ

.

8. The method claimed in claim 7, wherein said Moire topography method is phase-shifting Moire topography.

9. The method claimed in claim 8, wherein said test pattern is formed by projecting an image of a grid.

10. The method claimed in claim 8, wherein said test pattern is formed by projecting an interference pattern.

11. The method claimed in claim 1, wherein said Moire contouring method is Moire deflectometry, said test pattern being formed by reflecting a beam of collimated light from the surface of a specularly reflecting object and modulating the reflected beam with a grating having a pitch d, the samples of said Moire pattern being formed by an image sensor having an array of image sensing elements located a distance A from the grating, and

12. Moire contouring apparatus comprising:

a. means for forming a test pattern of spaced lines having distortion representing a contour of a test surface;

b. means responsive to an image of said test pattern for generating a first signal representing samples of a Moire pattern formed by a product of said test pattern and a reference pattern representing a reference surface;

c. computer means for;

14. The apparatus claimed in claim 12, wherein said a priori knowledge of the test surface is:

(1) that the test surface is smooth, such that the test surface can be represented by a function having continuous derivatives, and (2) a location of a neighborhood on the test surface where the height difference between the test surface and the reference surface changes by less than C/2 per sample; and

further including display means for displaying an image of the Moire pattern, and operator controlled input means for an operator to input the coordinates of said location of a neighborhood on the test surface.

16. The apparatus claimed in claim 14, wherein G=0.1.

17. The apparatus claimed in claim 12, wherein said Moire contouring apparatus comprises apparatus for conducting Moire topography, said means for forming a test pattern comprising means for projecting along a projection axis a fringe pattern having a period d onto a surface of a diffusely reflecting object, said means for generating said first signal comprising an image sensing array arranged to view said surface at an angle θ

from the projection axis of said fringe pattern, whereby

space="preserve" listing-type="equation">C=d/tan θ

.

18. The apparatus claimed in claim 16, wherein said Moire topography apparatus comprises apparatus for conducting phase-shifting Moire topography, said means for generating said first signal including means for phase shifting said test pattern with respect to said reference pattern and sampling said Moire pattern three or more times, and said computer means forming said signal representing height difference modulo C from said phase-shifted samples.

19. The apparatus claimed in claim 17, wherein said means for projecting a fringe pattern comprises a light source, projection optics defining a projection axis, and a grid, said means for shifting the phase of said fringe pattern comprises means for displacing said grid in a direction perpendicular to the projection axis.

20. The apparatus claimed in claim 17, wherein said means for projecting a fringe pattern comprises a Twyman-Green interferometer having a source of a beam of collimated light, a beamsplitter and a pair of plane mirrors, and the means for shifting the phase of said fringe pattern comprises means for displacing one of said plane mirrors parallel to the collimated light beams.

21. The apparatus claimed in claim 12, wherein said Moire contouring apparatus comprises apparatus for conducting Moire deflectometry, said means for forming a test pattern comprising means for shining a beam of collimated light onto the surface of a specularly reflecting object, a grating having a pitch d for modulating a reflected beam, and an image sensor having an array of image sensing elements located a distance A from the grating, and

13. calculating from said Moire pattern samples, height difference samples representing the difference in height between the test surface and the reference surface, said height difference samples being expressed modulo C, where C is a function of the spacing of lines in said test pattern and where said height difference samples can differ by more than C/2 between adjacent samples;

2. receiving a second signal representing a priori knowledge of the contour of the test surface, and responsive to said first and second signals for generating a third signal representing samples of the actual height difference between said test surface and said reference surface, by adjusting said height difference samples by multiples of C such that the height difference is correctly reconstructed when the height difference changes by more than C/2 per sample.

15. The apparatus claimed in claim 13, wherein said means for generating said first signal comprises a sparse array of image sensing elements having width and pitch and being defined by a parameter G being less than 0.5 where:

space="preserve" listing-type="equation">G=a/x.sub.s and

a is the width of an image sensing element and x_s is the pitch of elements in said array.